Substrate retainer
AssigneeBlack Semiconductor Netherlands B.V.
InventorsRichard van Rijn, Michele Buscema, Matthew David Barnes, Kris Charles Leask, Mohammad Sohail Shaik
Life of this patent
Estimating the term…
Abstract
A retainer for holding a substrate during chemical vapor deposition, CVD, processing, the retainer having: a first surface configured to form a counter surface for an exposure surface of the substrate; a second surface, substantially parallel to the counter surface and arranged at a distance, d, from the counter surface, the second surface arranged for supporting the substrate; a third surface, arranged at an angle to the second surface, the third surface forming an edge confining movement of the substrate.
Claims16
A retainer for holding a substrate during chemical vapor deposition, CVD, processing, the retainer comprising:
- a first surface configured to form a counter surface relative to an exposure surface of the substrate;
- a second surface, substantially parallel to the counter surface and arranged at a distance, d, from the counter surface, the second surface arranged for supporting the substrate;
- a third surface, arranged at an angle to the second surface, the third surface forming an edge for confining movement of the substrate.
Method for fabricating a retainer for holding a substrate, the method comprising:
- providing a main body having a first surface;
- forming a counter surface on the first surface;
- forming a second surface substantially parallel to the counter surface and arranged at a distance, d, from the counter surface, the second surface configured for supporting the substrate;
- forming a third surface, arranged at an angle to the second surface, the third surface forming an edge for confining movement of the substrate;
- wherein the step of forming the counter surface comprises:
- a first processing step to form the distance, d, between the second surface and the portion of the first surface which is to form the counter surface;
- a second processing step applied to the portion of the first surface, the second processing step comprising reducing a roughness of the portion of the first surface resulting after the first processing step.
Method for fabricating a retainer for holding a substrate, the method comprising:
- providing a main body having a first surface;
- forming a counter surface on the first surface;
- forming a second surface substantially parallel to the counter surface and arranged at a distance, d, from the counter surface, the second surface configured for supporting the substrate;
- forming a third surface, arranged at an angle to the second surface, the third surface forming an edge for confining movement of the substrate;
- wherein the step of forming a counter surface comprises:
- forming a groove at least partially around a portion of the first surface which is to form the counter surface;
- placing a plurality of support elements in the groove, each of the support elements comprising the second surface, and at least one of the support elements further comprising the third surface.
Dependencies are inferred from the claim text.