C23C 16/4558
Perforated rings
Official title: {Perforated rings}
C23C16/4558 (Perforated rings) appears on 211 US grants and 207 published applications in this corpus.
Search patents in C23C- Granted patents
- 211
- Published applications
- 207
- Assignees
- 84
- Inventors
- 578
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1985 | 2 | 0 |
| 1986 | 1 | 0 |
| 1987 | 1 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 2 | 0 |
| 1992 | 5 | 0 |
| 1993 | 0 | 0 |
| 1994 | 5 | 0 |
| 1995 | 10 | 0 |
| 1996 | 7 | 0 |
| 1997 | 8 | 0 |
| 1998 | 9 | 0 |
| 1999 | 5 | 0 |
| 2000 | 10 | 0 |
| 2001 | 5 | 4 |
| 2002 | 8 | 8 |
| 2003 | 4 | 11 |
| 2004 | 9 | 14 |
| 2005 | 5 | 6 |
| 2006 | 1 | 7 |
| 2007 | 4 | 3 |
| 2008 | 3 | 7 |
| 2009 | 1 | 3 |
| 2010 | 4 | 7 |
| 2011 | 2 | 6 |
| 2012 | 4 | 8 |
| 2013 | 2 | 10 |
| 2014 | 5 | 2 |
| 2015 | 5 | 9 |
| 2016 | 7 | 13 |
| 2017 | 5 | 11 |
| 2018 | 3 | 9 |
| 2019 | 10 | 12 |
| 2020 | 11 | 8 |
| 2021 | 12 | 3 |
| 2022 | 9 | 14 |
| 2023 | 7 | 13 |
| 2024 | 8 | 6 |
| 2025 | 4 | 7 |
| 2026 | 8 | 6 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Shower head, electrode unit, gas supply unit, substrate processing apparatus, and substrate processing system6 Oct 2026US 12,753,502 B2Tokyo Electron Limited
- Gas inlet element of a CVD reactor with two infeed points6 Oct 2026US 12,753,505 B2Aixtron SE
- Wall-cooled gas-inlet element for a CVD reactor28 Jul 2026US 12,692,602 B2Aixtron SE
- Low mass substrate support24 Mar 2026US 12,584,240 B2APPLIED Materials.Inc.
- Multi-port cross flow system24 Mar 2026US 12,586,767 B2APPLIED Materials.Inc.
- Process reactor and method for producing structures on a substrate10 Sep 2026US 2026/0265911 A1
- Gas inlet for a cvd reactor23 Jul 2026US 2026/0209941 A1Aixtron SE
- Multi-port cross flow system9 Jul 2026US 2026/0196453 A1APPLIED Materials.Inc.
- Low mass substrate support25 Jun 2026US 2026/0176790 A1APPLIED Materials.Inc.
- Gas distributor, gas delivery apparatus, and film processing apparatus thereof23 Apr 2026US 2026/0110090 A1Advanced Micro-Fabrication Equipment Inc. China
Most cited
By later US patents
- Processing apparatus and method for plasma processing739US 5,134,965 AHitachi, Ltd. · 1992
- Methods and apparatus for material deposition577US 5,119,760 ASymetrix Corporation · 1992
- Gas injection system for semiconductor processing555US 5,851,294 AWatkins-Johnson Company · 1998
- Method and apparatus for uniform flow distribution in plasma reactors446US 5,084,126 ATexas Instruments Incorporated · 1992
- Method and apparatus for preparing integrated circuit thin films by chemical vapor deposition442US 6,110,531 ASymetrix Corporation · 2000