C23C 16/45565
Shower nozzles
Official title: {Shower nozzles}
C23C16/45565 (Shower nozzles) appears on 1,751 US grants and 2,542 published applications in this corpus.
Search patents in C23C- Granted patents
- 1,751
- Published applications
- 2,542
- Assignees
- 430
- Inventors
- 4,573
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1981 | 1 | 0 |
| 1982 | 0 | 0 |
| 1983 | 0 | 0 |
| 1984 | 0 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 1 | 0 |
| 1988 | 1 | 0 |
| 1989 | 6 | 0 |
| 1990 | 4 | 0 |
| 1991 | 9 | 0 |
| 1992 | 4 | 0 |
| 1993 | 4 | 0 |
| 1994 | 9 | 0 |
| 1995 | 15 | 0 |
| 1996 | 11 | 0 |
| 1997 | 16 | 0 |
| 1998 | 20 | 0 |
| 1999 | 31 | 0 |
| 2000 | 55 | 0 |
| 2001 | 50 | 20 |
| 2002 | 55 | 64 |
| 2003 | 36 | 53 |
| 2004 | 30 | 67 |
| 2005 | 28 | 84 |
| 2006 | 20 | 59 |
| 2007 | 15 | 71 |
| 2008 | 21 | 50 |
| 2009 | 24 | 87 |
| 2010 | 38 | 76 |
| 2011 | 36 | 94 |
| 2012 | 50 | 99 |
| 2013 | 46 | 77 |
| 2014 | 60 | 78 |
| 2015 | 60 | 91 |
| 2016 | 70 | 116 |
| 2017 | 66 | 104 |
| 2018 | 65 | 110 |
| 2019 | 101 | 147 |
| 2020 | 106 | 137 |
| 2021 | 97 | 122 |
| 2022 | 110 | 169 |
| 2023 | 94 | 170 |
| 2024 | 102 | 142 |
| 2025 | 112 | 146 |
| 2026 | 72 | 109 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Shower head, electrode unit, gas supply unit, substrate processing apparatus, and substrate processing system6 Oct 2026US 12,753,502 B2Tokyo Electron Limited
- Semiconductor process chamber6 Oct 2026US 12,753,503 B2Hanwha Precision Machinery Co., Ltd.
- Substrate processing apparatus6 Oct 2026US 12,753,507 B2Tokyo Electron Limited
- Substrate processing apparatus, method of manufacturing semiconductor device, method of processing substrate, and recording medium29 Sep 2026US 12,747,501 B2Kokusai Electric Corporation
- Plasma showerhead assembly and method of reducing defects29 Sep 2026US 12,747,502 B2APPLIED Materials.Inc.
- Reactant vapor delivery systems for semiconductor processing tools and methods8 Oct 2026US 2026/0308757 A1ASM IP Holding B. V.
- Device and method for mist chemical vapor deposition of large-size semiconductor thin film8 Oct 2026US 2026/0308759 A1Tiangong University
- Integration of vapor deposition process into plasma etch reactor8 Oct 2026US 2026/0311972 A1Lam Research Corporation
- Method, assembly and kit for transporting a gas distribution device1 Oct 2026US 2026/0296731 A1ASM IP Holding B. V.
- Processing apparatus for substrate1 Oct 2026US 2026/0297749 A1Nexusbe Co., Ltd
Most cited
By later US patents
- Dual gas faceplate for a showerhead in a semiconductor wafer processing system962US 6,086,677 AAPPLIED Materials.Inc. · 2000
- Shower head and film forming apparatus using the same883US 5,595,606 ATokyo Electron Limited · 1997
- One-piece dual gas faceplate for a showerhead in a semiconductor wafer processing system864US 6,302,964 B1APPLIED Materials.Inc. · 2001
- Gas introduction showerhead for an RTP chamber with upper and lower transparent plates and gas flow therebetween832US 5,781,693 AAPPLIED Materials.Inc. · 1998
- Thermal CVD/PECVD reactor and use for thermal chemical vapor deposition of silicon dioxide and in-situ multi-step planarized process777US 5,000,113 AAPPLIED Materials.Inc. · 1991