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US 12,753,503 B2Granted
Semiconductor process chamber
AssigneeHanwha Precision Machinery Co., Ltd.
InventorsDong Won Seo, Ju Yeon Kwon, Yu Ri Shin
Life of this patent
Estimating the term…
Abstract
Provided is a semiconductor process chamber including a chamber configured to accommodate a wafer, and a shower head on an upper side of the chamber and including a plurality of nozzles, wherein the shower head includes a gas supplier configured to supply gas to the shower head, and wherein the gas supplier includes a gas line, a heating jacket adjacent to the gas line, and a heating jacket cover adjacent to the heating jacket.
Claims20
A semiconductor process chamber comprising:
- a chamber configured to accommodate a wafer;
- and
- a shower head on an upper side of the chamber and comprising a plurality of nozzles;
- wherein the shower head comprises a gas supplier configured to supply gas to the shower head, and
- wherein the gas supplier comprises:
- a gas line;
- a heating jacket on the gas line;
- and
- a heating jacket cover on the heating jacket,
- wherein the heating jacket cover comprises a first layer on the heating jacket, and
- wherein a thickness of the first layer in a radial direction of the gas supplier increases in an axial direction of the gas supplier toward the chamber.
8 more elements
A semiconductor process chamber comprising:
- a chamber configured to accommodate a wafer;
- and
- a shower head on an upper side of the chamber and comprising a plurality of nozzles;
- wherein the shower head comprises a gas supplier configured to supply gas to the shower head,
- wherein the gas supplier comprises:
- a gas line;
- a heating jacket on the gas line;
- and
- a heating jacket cover on the heating jacket,
- wherein the heating jacket cover comprises:
- a first layer on the heating jacket;
- and
- a second layer on the first layer, and
- wherein a thickness of the first layer in a radial direction of the gas supplier increases in an axial direction of the gas supplier toward the chamber.
11 more elements
Dependencies are inferred from the claim text.