C23C 16/45519
Inert gas curtains
Official title: {Inert gas curtains}
C23C16/45519 (Inert gas curtains) appears on 620 US grants and 689 published applications in this corpus.
Search patents in C23C- Granted patents
- 620
- Published applications
- 689
- Assignees
- 241
- Inventors
- 1,682
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1977 | 1 | 0 |
| 1978 | 0 | 0 |
| 1979 | 0 | 0 |
| 1980 | 0 | 0 |
| 1981 | 0 | 0 |
| 1982 | 1 | 0 |
| 1983 | 0 | 0 |
| 1984 | 0 | 0 |
| 1985 | 1 | 0 |
| 1986 | 1 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 5 | 0 |
| 1990 | 3 | 0 |
| 1991 | 7 | 0 |
| 1992 | 5 | 0 |
| 1993 | 7 | 0 |
| 1994 | 18 | 0 |
| 1995 | 10 | 0 |
| 1996 | 13 | 0 |
| 1997 | 11 | 0 |
| 1998 | 15 | 0 |
| 1999 | 18 | 0 |
| 2000 | 23 | 0 |
| 2001 | 36 | 9 |
| 2002 | 15 | 19 |
| 2003 | 20 | 23 |
| 2004 | 20 | 29 |
| 2005 | 11 | 25 |
| 2006 | 8 | 21 |
| 2007 | 9 | 12 |
| 2008 | 11 | 18 |
| 2009 | 11 | 24 |
| 2010 | 11 | 28 |
| 2011 | 9 | 28 |
| 2012 | 14 | 23 |
| 2013 | 20 | 22 |
| 2014 | 14 | 26 |
| 2015 | 25 | 37 |
| 2016 | 15 | 26 |
| 2017 | 20 | 32 |
| 2018 | 23 | 25 |
| 2019 | 24 | 31 |
| 2020 | 22 | 38 |
| 2021 | 21 | 28 |
| 2022 | 25 | 48 |
| 2023 | 25 | 49 |
| 2024 | 27 | 19 |
| 2025 | 34 | 28 |
| 2026 | 11 | 21 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Method of processing substrate, recording medium, substrate processing apparatus and method of manufacturing semiconductor device6 Oct 2026US 12,757,652 B2Kokusai Electric Corporation
- Substrate processing apparatus, method of manufacturing semiconductor device, method of processing substrate, and recording medium29 Sep 2026US 12,747,501 B2Kokusai Electric Corporation
- Structures and methods for processing a semiconductor substrate22 Sep 2026US 12,742,237 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Chemical vapour deposition (CVD) reactor1 Sep 2026US 12,723,310 B2Sicona Battery Technologies Pty Ltd
- Organic vapor jet printing system18 Aug 2026US 12,709,804 B2Universal Display Corporation
- An atomic layer deposition apparatus and a method for coating a substrate24 Sep 2026US 2026/0286516 A1Beneq Oy
- Substrate processing apparatus, method of manufacturing semiconductor device, and recording medium10 Sep 2026US 2026/0265916 A1Kokusai Electric Corporation
- Substrate backside protection20 Aug 2026US 2026/0242942 A1Picosun Oy
- Electronic devices and circuits6 Aug 2026US 2026/0226608 A1Pragmatic Semiconductor Limited
- Bottom purge for semiconductor processing system30 Jul 2026US 2026/0223622 A1APPLIED Materials.Inc.
Most cited
By later US patents
- Apparatus and method for growth of a thin film940US 6,511,539 B1ASM America, Inc. · 2003
- Thermal CVD/PECVD reactor and use for thermal chemical vapor deposition of silicon dioxide and in-situ multi-step planarized process777US 5,000,113 AAPPLIED Materials.Inc. · 1991
- Wafer support system670US 6,053,982 AASM America, Inc. · 2000
- Integrated module multi-chamber CVD processing system and its method for processing substrates655US 5,494,494 AAnelva Corporation · 1996
- Rotatable substrate supporting mechanism with temperature sensing device for use in chemical vapor deposition equipment622US 4,821,674 A1989