Method of processing substrate, recording medium, substrate processing apparatus and method of manufacturing semiconductor device

A non-transitory computer-readable recording medium storing a program that causes, by a computer, a substrate processing apparatus to perform a process comprising:

• (a) supplying a metal element-containing gas to a substrate accommodated in a process vessel;
• (b) supplying a reducing gas to the substrate;
• (c) performing (a) and (b) a predetermined number of times to form a film containing a metal element on the substrate;
• (d) supplying a modifying gas to the film to form a layer including an element contained in the modifying gas on a surface of the film after (c);
• (e) creating a rare gas atmosphere in the process vessel and in a transfer chamber adjacent to the process vessel and carrying the substrate out of the process vessel and into the transfer chamber after (d);
• (f) creating an inert gas atmosphere excluding a rare gas in the process vessel and in the transfer chamber and carrying the substrate from the transfer chamber into the process vessel before (a);
• and
• (g) replacing the inert gas atmosphere excluding the rare gas inside the transfer chamber with the rare gas atmosphere between (f) and (e).