C23C 16/45508
Radial flow
Official title: {Radial flow}
C23C16/45508 (Radial flow) appears on 195 US grants and 241 published applications in this corpus.
Search patents in C23C- Granted patents
- 195
- Published applications
- 241
- Assignees
- 99
- Inventors
- 555
- Latest grant
- 28 Jul 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1977 | 1 | 0 |
| 1978 | 0 | 0 |
| 1979 | 1 | 0 |
| 1980 | 0 | 0 |
| 1981 | 0 | 0 |
| 1982 | 0 | 0 |
| 1983 | 0 | 0 |
| 1984 | 0 | 0 |
| 1985 | 1 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 1 | 0 |
| 1989 | 1 | 0 |
| 1990 | 3 | 0 |
| 1991 | 1 | 0 |
| 1992 | 2 | 0 |
| 1993 | 2 | 0 |
| 1994 | 4 | 0 |
| 1995 | 2 | 0 |
| 1996 | 2 | 0 |
| 1997 | 1 | 0 |
| 1998 | 3 | 0 |
| 1999 | 1 | 0 |
| 2000 | 4 | 0 |
| 2001 | 7 | 2 |
| 2002 | 5 | 6 |
| 2003 | 4 | 10 |
| 2004 | 3 | 11 |
| 2005 | 7 | 9 |
| 2006 | 6 | 5 |
| 2007 | 3 | 10 |
| 2008 | 4 | 11 |
| 2009 | 1 | 11 |
| 2010 | 8 | 14 |
| 2011 | 3 | 6 |
| 2012 | 13 | 9 |
| 2013 | 2 | 11 |
| 2014 | 8 | 7 |
| 2015 | 5 | 9 |
| 2016 | 11 | 15 |
| 2017 | 2 | 6 |
| 2018 | 3 | 11 |
| 2019 | 9 | 5 |
| 2020 | 9 | 8 |
| 2021 | 13 | 16 |
| 2022 | 7 | 13 |
| 2023 | 7 | 7 |
| 2024 | 7 | 11 |
| 2025 | 6 | 7 |
| 2026 | 12 | 11 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Wall-cooled gas-inlet element for a CVD reactor28 Jul 2026US 12,692,602 B2Aixtron SE
- Vapor phase growth system and method of producing epitaxial wafer14 Jul 2026US 12,680,191 B2Epicrew Corporation
- Uniform deposition30 Jun 2026US 12,668,877 B2Picosun Oy
- Substrate processing apparatus with flow control ring, and substrate processing method26 May 2026US 12,637,766 B2ASM IP Holding B. V.
- Apparatuses for cleaning a multi-station semiconductor processing chamber31 Mar 2026US 12,593,641 B2Lam Research Corporation
- Substrate processing apparatus with flow control ring, and substrate processing method6 Aug 2026US 2026/0226618 A1ASM IP Holding B. V.
- Gas inlet for a cvd reactor23 Jul 2026US 2026/0209941 A1Aixtron SE
- Method for setting up a cvd reactor9 Jul 2026US 2026/0193786 A1Aixtron SE
- Apparatuses for cleaning a multi-station semiconductor processing chamber9 Jul 2026US 2026/0198246 A1Lam Research Corporation
- Low mass substrate support25 Jun 2026US 2026/0176790 A1APPLIED Materials.Inc.
Most cited
By later US patents
- Thermally floating pedestal collar in a chemical vapor deposition chamber805US 5,846,332 AAPPLIED Materials.Inc. · 1998
- Induction heated pancake epitaxial reactor616US 5,062,386 AEpitaxy Systems, Inc. · 1991
- Chemical vapor deposition reactor and method of use thereof610US 4,976,996 ALam Research Corporation · 1990
- Gas delivery apparatus and method for atomic layer deposition586US 6,916,398 B2APPLIED Materials.Inc. · 2005
- Gas injection system for semiconductor processing555US 5,851,294 AWatkins-Johnson Company · 1998