Apparatuses for cleaning a multi-station semiconductor processing chamber

An apparatus for facilitating semiconductor processing operations, the apparatus comprising a deflector plate comprising:

• a body having a top surface and an underside surface that are on opposite sides of the body;
• and
• a plurality of recesses in the top surface and arranged in a radial pattern around a center axis, wherein, for each recess:
• that recess is at least partially defined by a corresponding bottom surface, a corresponding first side surface, a corresponding second side surface, and a corresponding front surface,
• the first side surface, the second side surface, and the front surface intersect the bottom surface,
• the front surface spans between the first side surface and the second side surface, and
• the front surface spans between the bottom surface and an outer edge of the recess that is radially outwards from the bottom surface in a direction perpendicular to the center axis and farther from the underside surface than the bottom surface in a direction parallel to the center axis.