C23C 16/4412
Details relating to the exhausts
Official title: {Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps}
C23C16/4412 (Details relating to the exhausts) appears on 1,853 US grants and 2,488 published applications in this corpus.
Search patents in C23C- Granted patents
- 1,853
- Published applications
- 2,488
- Assignees
- 591
- Inventors
- 4,699
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1977 | 1 | 0 |
| 1978 | 1 | 0 |
| 1979 | 1 | 0 |
| 1980 | 0 | 0 |
| 1981 | 0 | 0 |
| 1982 | 0 | 0 |
| 1983 | 0 | 0 |
| 1984 | 0 | 0 |
| 1985 | 4 | 0 |
| 1986 | 2 | 0 |
| 1987 | 2 | 0 |
| 1988 | 5 | 0 |
| 1989 | 4 | 0 |
| 1990 | 2 | 0 |
| 1991 | 4 | 0 |
| 1992 | 5 | 0 |
| 1993 | 6 | 0 |
| 1994 | 12 | 0 |
| 1995 | 23 | 0 |
| 1996 | 30 | 0 |
| 1997 | 24 | 0 |
| 1998 | 31 | 0 |
| 1999 | 47 | 0 |
| 2000 | 71 | 0 |
| 2001 | 65 | 37 |
| 2002 | 48 | 64 |
| 2003 | 47 | 63 |
| 2004 | 54 | 64 |
| 2005 | 45 | 78 |
| 2006 | 11 | 47 |
| 2007 | 27 | 68 |
| 2008 | 18 | 48 |
| 2009 | 19 | 81 |
| 2010 | 41 | 61 |
| 2011 | 33 | 55 |
| 2012 | 33 | 69 |
| 2013 | 41 | 67 |
| 2014 | 52 | 56 |
| 2015 | 57 | 131 |
| 2016 | 55 | 112 |
| 2017 | 61 | 114 |
| 2018 | 71 | 120 |
| 2019 | 86 | 118 |
| 2020 | 110 | 135 |
| 2021 | 78 | 121 |
| 2022 | 106 | 184 |
| 2023 | 92 | 168 |
| 2024 | 123 | 150 |
| 2025 | 121 | 150 |
| 2026 | 84 | 127 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Flow control arrangements, semiconductor processing systems having flow control arrangements, and flow control methods6 Oct 2026US 12,753,499 B2ASM IP Holding B. V.
- Substrate processing apparatus6 Oct 2026US 12,753,507 B2Tokyo Electron Limited
- Method of processing substrate, recording medium, substrate processing apparatus and method of manufacturing semiconductor device6 Oct 2026US 12,757,652 B2Kokusai Electric Corporation
- Exhaust system and exhaust method using buffer29 Sep 2026US 12,746,501 B2Samsung Electronics Co., Ltd.
- Atomic layer deposition apparatus29 Sep 2026US 12,747,499 B2Beneq Oy
- Heat management systems and methods8 Oct 2026US 2026/0308758 A1ASM IP Holding B. V.
- Device and method for mist chemical vapor deposition of large-size semiconductor thin film8 Oct 2026US 2026/0308759 A1Tiangong University
- Liner for batch semiconductor processing apparatus1 Oct 2026US 2026/0297733 A1ASM IP Holding B. V.
- Collecting apparatus and collecting method1 Oct 2026US 2026/0297739 A1Jusung Engineering Co., Ltd.
- Substrate processing method, method of manufacturing semiconductor device, non-transitory computer-readable recording medium and substrate processing apparatus1 Oct 2026US 2026/0297740 A1Kokusai Electric Corporation
Most cited
By later US patents
- CVD Processing chamber1,003US 5,558,717 AAPPLIED Materials.Inc. · 1996
- Thermally floating pedestal collar in a chemical vapor deposition chamber805US 5,846,332 AAPPLIED Materials.Inc. · 1998
- Film deposition apparatus and film deposition method738US 8,506,713 B2Tokyo Electron Limited · 2013
- Deposition reactor having vaporizing, mixing and cleaning capabilities631US 6,454,860 B2APPLIED Materials.Inc. · 2002
- Film forming method wherein a partial pressure of a reaction byproduct in a processing container is reduced temporarily625US 5,503,875 ATokyo Electron Limited · 1996