Substrate processing method, method of manufacturing semiconductor device, non-transitory computer-readable recording medium and substrate processing apparatus

A non-transitory computer-readable recording medium storing a program that causes a substrate processing apparatus, by a computer, to perform:

• (a) performing:
• (a1) supplying a process gas to a substrate arranged in a process chamber through a supplier;
• and
• (a2) exhausting a gas in the process chamber through a main exhaust path configured to connect the process chamber to an exhaust apparatus;
• and
• (b) exhausting a predetermined gas in the supplier through a subsidiary exhaust path configured to connect the supplier to the main exhaust path without passing through the process chamber, while suppressing or blocking a gas flow from the main exhaust path to the process chamber.

A substrate processing apparatus comprising:

• a process chamber in which a substrate is arranged;
• a main exhaust path configured to connect the process chamber to an exhaust apparatus;
• a supplier configured to control a gas circulation between a supply source of a process gas, a supply source of a predetermined gas and the process chamber;
• a subsidiary exhaust path configured to connect the supplier to the main exhaust path without passing through the process chamber;
• an exhauster configured to control an exhaust of the gas through the main exhaust path and an exhaust of the gas through the subsidiary exhaust path;
• a predetermined structure configured to suppress or block a gas flow from the main exhaust path to the process chamber;
• and
• a controller configured to be capable of controlling the supplier, the exhauster and the predetermined structure so as to perform:
• (a) performing:
• (a1) supplying the process gas to the substrate through the supplier;
• and
• (a2) exhausting the gas in the process chamber through the main exhaust path;
• and
• (b) exhausting the predetermined gas in the supplier through the subsidiary exhaust path while suppressing or blocking the gas flow from the main exhaust path to the process chamber.