C23C 14/58
After-treatment
C23C14/58 (After-treatment) appears on 2,138 US grants and 2,789 published applications in this corpus.
Search patents in C23C- Granted patents
- 2,138
- Published applications
- 2,789
- Assignees
- 1,223
- Inventors
- 6,745
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 5 | 0 |
| 1977 | 3 | 0 |
| 1978 | 2 | 0 |
| 1979 | 4 | 0 |
| 1980 | 9 | 0 |
| 1981 | 4 | 0 |
| 1982 | 1 | 0 |
| 1983 | 4 | 0 |
| 1984 | 8 | 0 |
| 1985 | 4 | 0 |
| 1986 | 4 | 0 |
| 1987 | 16 | 0 |
| 1988 | 8 | 0 |
| 1989 | 14 | 0 |
| 1990 | 8 | 0 |
| 1991 | 11 | 0 |
| 1992 | 7 | 0 |
| 1993 | 13 | 0 |
| 1994 | 21 | 0 |
| 1995 | 13 | 0 |
| 1996 | 17 | 0 |
| 1997 | 23 | 0 |
| 1998 | 37 | 0 |
| 1999 | 38 | 0 |
| 2000 | 43 | 0 |
| 2001 | 38 | 19 |
| 2002 | 37 | 39 |
| 2003 | 31 | 70 |
| 2004 | 41 | 63 |
| 2005 | 36 | 59 |
| 2006 | 28 | 70 |
| 2007 | 35 | 75 |
| 2008 | 30 | 64 |
| 2009 | 33 | 82 |
| 2010 | 48 | 130 |
| 2011 | 44 | 93 |
| 2012 | 61 | 135 |
| 2013 | 78 | 115 |
| 2014 | 65 | 107 |
| 2015 | 72 | 128 |
| 2016 | 81 | 181 |
| 2017 | 122 | 191 |
| 2018 | 118 | 138 |
| 2019 | 117 | 148 |
| 2020 | 121 | 163 |
| 2021 | 114 | 140 |
| 2022 | 86 | 153 |
| 2023 | 101 | 134 |
| 2024 | 116 | 120 |
| 2025 | 111 | 91 |
| 2026 | 57 | 81 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Film forming method and film forming apparatus6 Oct 2026US 12,753,485 B2Tokyo Electron Limited
- Physical vapor deposition system and methods of operating the same29 Sep 2026US 12,747,492 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Film forming method, film forming device, and method for manufacturing semiconductor device8 Sep 2026US 12,729,423 B2Tokyo Electron Limited
- Strain resistance film, physical quantity sensor, and method for manufacturing the strain resistance film18 Aug 2026US 12,709,787 B2TDK Corporation
- Film formation apparatus and film formation method of gallium nitride film11 Aug 2026US 12,703,910 B2Japan Display Inc.
- Coated Materials for Heart Valve Applications and Methods of Making Same1 Oct 2026US 2026/0294621 A1St. Jude Medical, Cardiology Division, Inc.
- Fabrication method of high-aspect-ratio double-layer diamond nanostructure17 Sep 2026US 2026/0275574 A1Institute of Physics, Chinese Academy of Sciences
- Seam free molybdenum gap fill10 Sep 2026US 2026/0265906 A1APPLIED Materials.Inc.
- Wire rod deposition system3 Sep 2026US 2026/0258545 A1Maru L&C Co., Ltd.
- Methods of making silver/silver chloride electrodes by vapor deposition techniques27 Aug 2026US 2026/0250835 A1Rhythmlink International, LLC
Most cited
By later US patents
- System and method for forming a gate dielectric598US 6,858,547 B2APPLIED Materials.Inc. · 2005
- Magnetron sputtering apparatus and process326US 4,851,095 AOptical Coating Laboratory, Inc. · 1989
- Method for planarized interconnect vias using electroless plating and CMP263US 6,136,693 AChartered Semiconductor Manufacturing Ltd. · 2000
- Method for improving the morphology of refractory metal thin films242US 6,107,199 AInternational Business Machines Corporation · 2000
- Integrated circuit device and fabrication using metal-doped chalcogenide materials199US 6,800,504 B2Micron Technology, Inc. · 2004