C23C 14/544
Using measurement in the gas phase
Official title: {using measurement in the gas phase}
C23C14/544 (Using measurement in the gas phase) appears on 64 US grants and 70 published applications in this corpus.
Search patents in C23C- Granted patents
- 64
- Published applications
- 70
- Assignees
- 60
- Inventors
- 217
- Latest grant
- 23 Jul 2024
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1977 | 5 | 0 |
| 1978 | 1 | 0 |
| 1979 | 0 | 0 |
| 1980 | 0 | 0 |
| 1981 | 0 | 0 |
| 1982 | 0 | 0 |
| 1983 | 2 | 0 |
| 1984 | 0 | 0 |
| 1985 | 1 | 0 |
| 1986 | 1 | 0 |
| 1987 | 1 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 2 | 0 |
| 1993 | 1 | 0 |
| 1994 | 0 | 0 |
| 1995 | 0 | 0 |
| 1996 | 0 | 0 |
| 1997 | 2 | 0 |
| 1998 | 3 | 0 |
| 1999 | 1 | 0 |
| 2000 | 3 | 0 |
| 2001 | 0 | 1 |
| 2002 | 2 | 2 |
| 2003 | 0 | 4 |
| 2004 | 5 | 1 |
| 2005 | 0 | 4 |
| 2006 | 1 | 0 |
| 2007 | 0 | 5 |
| 2008 | 2 | 3 |
| 2009 | 0 | 3 |
| 2010 | 3 | 4 |
| 2011 | 1 | 5 |
| 2012 | 3 | 5 |
| 2013 | 2 | 1 |
| 2014 | 2 | 7 |
| 2015 | 2 | 2 |
| 2016 | 5 | 4 |
| 2017 | 2 | 2 |
| 2018 | 3 | 4 |
| 2019 | 2 | 2 |
| 2020 | 0 | 4 |
| 2021 | 2 | 3 |
| 2022 | 2 | 1 |
| 2023 | 1 | 0 |
| 2024 | 1 | 3 |
By publication year. Applications have been published since 2001.
Recent patents
- Film formation apparatus and moisture removal method thereof23 Jul 2024US 12,043,898 B2Shibaura Mechatronics Corporation
- Method and apparatus for deposition of metal nitrides29 Aug 2023US 11,739,418 B2APPLIED Materials.Inc.
- Film forming apparatus and film forming method using the same16 Aug 2022US 11,414,746 B2Canon Kabushiki Kaisha
- Method for producing optical film19 Apr 2022US 11,306,392 B2Nitto Denko Corporation
- Device and method for determining the concentration of a vapor30 Nov 2021US 11,187,676 B2Aixtron SE
- Method for deposition of dense chromium on a substrate27 Jun 2024US 2024/0209493 A1Hydromecanique Et Frottement
- Steam distribution device and method relating to same25 Jan 2024US 2024/0026542 A1Von Ardenne Asset GmbH & Co. KG
- Method and Apparatus for Deposition of Mental Nitrides4 Jan 2024US 2024/0003000 A1APPLIED Materials.Inc.
- Method of fabricating superconducting wire6 Oct 2022US 2022/0319740 A1SuperOx Japan LLC
- Film formation apparatus and moisture removal method thereof19 Aug 2021US 2021/0254212 A1Shibaura Mechatronics Corporation
Most cited
By later US patents
- Film deposition device329US 7,354,482 B2Shimadzu Corporation · 2008
- Integrated circuit device and fabrication using metal-doped chalcogenide materials199US 6,800,504 B2Micron Technology, Inc. · 2004
- Method and apparatus for monitoring the deposition rate of films during physical vapor deposition111US 5,754,297 AAPPLIED Materials.Inc. · 1998
- Ion implantation control using charge collection, optical emission spectroscopy and mass analysis92US 6,101,971 AAxcelis Technologies, Inc. · 2000
- End point detection for sputtering and resputtering47US 7,048,837 B2APPLIED Materials.Inc. · 2006