H10P 34/422
Using incoherent radiation
Official title: {using incoherent radiation}
H10P34/422 (Using incoherent radiation) appears on 306 US grants and 314 published applications in this corpus.
Search patents in H10P- Granted patents
- 306
- Published applications
- 314
- Assignees
- 143
- Inventors
- 646
- Latest grant
- 25 Aug 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1977 | 1 | 0 |
| 1978 | 1 | 0 |
| 1979 | 1 | 0 |
| 1980 | 0 | 0 |
| 1981 | 1 | 0 |
| 1982 | 2 | 0 |
| 1983 | 2 | 0 |
| 1984 | 6 | 0 |
| 1985 | 13 | 0 |
| 1986 | 3 | 0 |
| 1987 | 4 | 0 |
| 1988 | 3 | 0 |
| 1989 | 1 | 0 |
| 1990 | 1 | 0 |
| 1991 | 1 | 0 |
| 1992 | 1 | 0 |
| 1993 | 2 | 0 |
| 1994 | 4 | 0 |
| 1995 | 1 | 0 |
| 1996 | 2 | 0 |
| 1997 | 0 | 0 |
| 1998 | 1 | 0 |
| 1999 | 1 | 0 |
| 2000 | 0 | 0 |
| 2001 | 1 | 1 |
| 2002 | 2 | 4 |
| 2003 | 4 | 6 |
| 2004 | 3 | 6 |
| 2005 | 7 | 5 |
| 2006 | 4 | 3 |
| 2007 | 4 | 7 |
| 2008 | 2 | 17 |
| 2009 | 8 | 18 |
| 2010 | 6 | 19 |
| 2011 | 14 | 18 |
| 2012 | 12 | 6 |
| 2013 | 11 | 19 |
| 2014 | 15 | 20 |
| 2015 | 18 | 28 |
| 2016 | 21 | 19 |
| 2017 | 18 | 17 |
| 2018 | 14 | 33 |
| 2019 | 18 | 16 |
| 2020 | 20 | 17 |
| 2021 | 17 | 12 |
| 2022 | 10 | 9 |
| 2023 | 7 | 4 |
| 2024 | 7 | 4 |
| 2025 | 4 | 4 |
| 2026 | 7 | 2 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Method of manufacturing semiconductor device, substrate processing method, substrate processing apparatus and non-transitory computer-readable recording medium25 Aug 2026US 12,721,093 B2Kokusai Electric Corporation
- Susceptor for semiconductor substrate processing11 Aug 2026US 12,707,938 B2ASM IP Holding B. V.
- CMOS well regions with high dopant activation level and reduced extended defects28 Jul 2026US 12,696,522 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Method of manufacturing semiconductor substrate and method of manufacturing semiconductor device2 Jun 2026US 12,648,405 B2Mitsubishi Electric Corporation
- Optical heating device with angled light holding substrate and method of heating treatment thereof12 May 2026US 12,628,607 B2Ushio Denki Kabushiki Kaisha
- Annealing apparatus and method for operating the annealing apparatus9 Jul 2026US 2026/0198252 A1National Tsing Hua University
- Semiconductor device and methods for manufacturing and inspecting the same28 May 2026US 2026/0150593 A1Highlight Tech Corp.
- Light irradiation type heat treatment method and heat treatment apparatus4 Sep 2025US 2025/0279294 A1SCREEN Holdings Co., Ltd.
- Heat treatment method and heat treatment apparatus for heating substrate by light irradiation7 Aug 2025US 2025/0253171 A1SCREEN Holdings Co., Ltd.
- Ohmic contact formation in a sic-based electronic device29 May 2025US 2025/0176235 A1STMicroelectronics International N. V.
Most cited
By later US patents
- Heating apparatus, heat treatment apparatus, computer program and storage medium557US 8,041,197 B2Tokyo Electron Limited · 2011
- Optical annealing method for semiconductor layer and method for producing semiconductor device employing the same semiconductor layer263US 5,312,771 ACanon Kabushiki Kaisha · 1994
- Processing systems and methods for halide scavenging218US 9,153,442 B2APPLIED Materials.Inc. · 2015
- Processing systems and methods for halide scavenging184US 9,023,732 B2APPLIED Materials.Inc. · 2015
- Processing systems and methods for halide scavenging183US 9,093,371 B2APPLIED Materials.Inc. · 2015