H01J 37/3447
Collimators, shutters, apertures
Official title: {Collimators, shutters, apertures}
H01J37/3447 (Collimators, shutters, apertures) appears on 330 US grants and 386 published applications in this corpus.
Search patents in H01J- Granted patents
- 330
- Published applications
- 386
- Assignees
- 166
- Inventors
- 863
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 1 | 0 |
| 1977 | 0 | 0 |
| 1978 | 0 | 0 |
| 1979 | 0 | 0 |
| 1980 | 0 | 0 |
| 1981 | 0 | 0 |
| 1982 | 0 | 0 |
| 1983 | 2 | 0 |
| 1984 | 1 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 1 | 0 |
| 1991 | 1 | 0 |
| 1992 | 0 | 0 |
| 1993 | 3 | 0 |
| 1994 | 3 | 0 |
| 1995 | 7 | 0 |
| 1996 | 8 | 0 |
| 1997 | 11 | 0 |
| 1998 | 12 | 0 |
| 1999 | 6 | 0 |
| 2000 | 8 | 0 |
| 2001 | 11 | 2 |
| 2002 | 4 | 4 |
| 2003 | 6 | 5 |
| 2004 | 7 | 1 |
| 2005 | 2 | 5 |
| 2006 | 1 | 13 |
| 2007 | 1 | 6 |
| 2008 | 2 | 8 |
| 2009 | 2 | 12 |
| 2010 | 3 | 11 |
| 2011 | 2 | 11 |
| 2012 | 3 | 15 |
| 2013 | 2 | 16 |
| 2014 | 8 | 22 |
| 2015 | 14 | 26 |
| 2016 | 15 | 20 |
| 2017 | 23 | 20 |
| 2018 | 20 | 22 |
| 2019 | 13 | 29 |
| 2020 | 21 | 16 |
| 2021 | 13 | 20 |
| 2022 | 19 | 27 |
| 2023 | 23 | 23 |
| 2024 | 21 | 25 |
| 2025 | 22 | 15 |
| 2026 | 8 | 12 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Shutter disc for a semiconductor processing tool6 Oct 2026US 12,753,488 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Sputtering apparatus29 Sep 2026US 12,749,665 B2Samsung Display Co., Ltd.
- In situ and tunable deposition of a film16 Jun 2026US 12,655,515 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Piezoelectric bulk layers with tilted c-axis orientation and methods for making the same7 Apr 2026US 12,597,902 B2Qorvo US, Inc.
- Deposition system and method17 Mar 2026US 12,577,653 B2Taiwan Semiconductor Manufacturing Company.Ltd
- In situ and tunable deposition of a film1 Oct 2026US 2026/0297727 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Method and device for providing a plasma for plasma treatment16 Jul 2026US 2026/0204523 A1Gruenwald Laboratories GmbH
- Thin film forming device2 Jul 2026US 2026/0185211 A1Samsung Display Co., Ltd.
- Sputter deposition source, magnetron sputter cathode, and method of depositing a material on a substrate28 May 2026US 2026/0146315 A1APPLIED Materials.Inc.
- Physical vapor deposition apparatus14 May 2026US 2026/0135070 A1Samsung Electronics Co., Ltd.
Most cited
By later US patents
- Stationary aperture plate for reactive sputter deposition566US 5,415,753 AMaterials Research Corporation · 1995
- Process kit and target for substrate processing chamber379US 9,127,362 B2APPLIED Materials.Inc. · 2015
- Rotating sputtering apparatus for selected erosion118US 5,252,194 AVarian Associates, Inc. · 1993
- Collimated deposition apparatus and method75US 5,330,628 AVarian Associates, Inc. · 1994
- Sputtering apparatus and methods61US 4,410,407 ARaytheon Company · 1983