Method and device for providing a plasma for plasma treatment

Abstract

A method for providing a plasma for plasma treatment of a surface of a substrate, includes providing a process chamber with a substrate in the process chamber; and providing a shielding electrode grid in the process chamber so that a Faraday cage is formed around the substrate, or the part of the substrate to be processed. The shielding electrode grid is electrically conductive and is connected to ground or to a negative potential with respect to ground. providing a plasma in the process chamber. A voltage is applied to the substrate. The shielding electrode grid extends above the surface of the substrate to be plasma treated at a distance of less than or equal to 10 mean free paths of the ions in the plasma. A corresponding device performs a method for providing a plasma for plasma treatment of a surface of a substrate.

Dependencies are inferred from the claim text.