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US 12,577,653 B2Granted
Deposition system and method
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsWen-Hao Cheng, Hsuan-Chih Chu, Yen-Yu Chen
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Abstract
A deposition system is provided capable of cleaning itself by removing a target material deposited on a surface of a collimator. The deposition system in accordance with the present disclosure includes a substrate process chamber. The deposition includes a substrate pedestal in the substrate process chamber, the substrate pedestal configured to support a substrate, a target enclosing the substrate process chamber, and a collimator having a plurality of hollow structures disposed between the target and the substrate, a vibration generating unit, and cleaning gas outlet.
Claims20
A method, comprising:
- determining a respective length of one or more adjustable hollow structures of a plurality of adjustable hollow structures of a collimator;
- adjusting the respective length of the one or more adjustable hollow structures of the collimator;
- and
- cleaning the collimator including:
- introducing a scrubbing gas into the collimator through a scrubbing gas receiving port;
- passing the scrubbing gas through a plurality of microchannels that are embedded within the collimator;
- and
- introducing the scrubbing gas into a plurality of hollow spaces of the plurality of adjustable hollow structures through a plurality of scrubbing gas outlets in fluid communication with the plurality of hollow spaces of the plurality of hollow structures through respective sidewalls of the collimator that define the plurality of hollow spaces.
5 more elements
A method, comprising:
- cleaning a collimator including:
- determining a condition of a substrate process chamber;
- placing the substrate process chamber in a chamber purging mode;
- applying vibration to the collimator in the substrate process chamber;
- and
- applying a scrubbing gas to the collimator;
- after cleaning the substrate process chamber and the collimator, obtaining an aspect ratio of a gap pattern of a substrate;
- determining respective lengths for each respective adjustable hollow structure of a plurality of adjustable hollow structures of the collimator based on the aspect ratio;
- and
- adjusting one or more of the respective lengths of one or more respective adjustable hollow structures of the plurality of adjustable hollow structures, and
- wherein applying the scrubbing gas to the collimator includes:
- introducing the scrubbing gas into the collimator through a scrubbing gas receiving port;
- passing the scrubbing gas through a plurality of microchannels that are embedded within the collimator;
- and
- introducing the scrubbing gas into a plurality of hollow spaces of the plurality of adjustable hollow structures through a plurality of scrubbing gas outlets in fluid communication with the plurality of hollow spaces of the plurality of hollow structures through respective sidewalls of the collimator that define the plurality of hollow spaces.
12 more elements
A method, comprising:
- forming a film of a material on a substrate including:
- determining a respective length of one or more of a plurality of adjustable hollow structures of a collimator;
- and
- adjusting the respective length of the one or more of the plurality of adjustable hollow structures of the collimator;
- cleaning the collimator including:
- determining a condition of a substrate process chamber;
- placing the substrate process chamber in a chamber purging mode;
- applying vibration to the collimator in the substrate process chamber;
- and
- applying scrubbing gas to the collimator including:
- introducing the scrubbing gas into the collimator through a scrubbing gas receiving port;
- passing the scrubbing gas through a plurality of microchannels that are embedded within the collimator;
- and
- introducing the scrubbing gas into a plurality of hollow spaces of the plurality of adjustable hollow structures through a plurality of scrubbing gas outlets in fluid communication with the plurality of hollow spaces of the plurality of adjustable hollow structures through respective sidewalls of the collimator that define the plurality of hollow spaces.
11 more elements
Dependencies are inferred from the claim text.