H01J 37/3429
Plural materials
Official title: {Plural materials}
H01J37/3429 (Plural materials) appears on 340 US grants and 482 published applications in this corpus.
Search patents in H01J- Granted patents
- 340
- Published applications
- 482
- Assignees
- 187
- Inventors
- 921
- Latest grant
- 4 Aug 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1980 | 1 | 0 |
| 1981 | 0 | 0 |
| 1982 | 0 | 0 |
| 1983 | 1 | 0 |
| 1984 | 4 | 0 |
| 1985 | 1 | 0 |
| 1986 | 3 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 4 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 3 | 0 |
| 1993 | 1 | 0 |
| 1994 | 3 | 0 |
| 1995 | 3 | 0 |
| 1996 | 1 | 0 |
| 1997 | 1 | 0 |
| 1998 | 2 | 0 |
| 1999 | 0 | 0 |
| 2000 | 1 | 0 |
| 2001 | 7 | 1 |
| 2002 | 1 | 1 |
| 2003 | 3 | 3 |
| 2004 | 4 | 4 |
| 2005 | 2 | 6 |
| 2006 | 1 | 7 |
| 2007 | 0 | 3 |
| 2008 | 0 | 3 |
| 2009 | 0 | 8 |
| 2010 | 3 | 10 |
| 2011 | 3 | 13 |
| 2012 | 1 | 8 |
| 2013 | 6 | 21 |
| 2014 | 4 | 30 |
| 2015 | 21 | 65 |
| 2016 | 25 | 54 |
| 2017 | 36 | 44 |
| 2018 | 30 | 31 |
| 2019 | 31 | 25 |
| 2020 | 32 | 30 |
| 2021 | 20 | 20 |
| 2022 | 13 | 32 |
| 2023 | 22 | 21 |
| 2024 | 17 | 29 |
| 2025 | 20 | 9 |
| 2026 | 9 | 4 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Particle removal during fabrication of electrochromic devices4 Aug 2026US 12,699,296 B2View Operating Corporation
- In situ and tunable deposition of a film16 Jun 2026US 12,655,515 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Doped nickel oxide target and preparation method and application thereof7 Apr 2026US 12,595,548 B2Contemporary Amperex Technology (Hong Kong) Limited
- Fabrication of electrochromic devices10 Mar 2026US 12,572,047 B2View Operating Corporation
- Method for producing sputtering target material3 Mar 2026US 12,564,880 B2Sanyo Special Steel Co., Ltd.
- In situ and tunable deposition of a film1 Oct 2026US 2026/0297727 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Doped nickel oxide target and preparation method and application thereof16 Jul 2026US 2026/0201542 A1Contemporary Amperex Technology (Hong Kong) Limited
- CoZrTa(X) Sputtering Target with Improved Magnetic Properties25 Jun 2026US 2026/0176744 A1Materion Advanced Materials Germany GmbH
- Sintered body, sputtering target, oxide thin film, thin film transistor and method of manufacturing sintered body4 Jun 2026US 2026/0152845 A1H & Iruja Co., Ltd.
- Tungsten silicide target and method for manufacturing same, and method for manufacturing tungsten silicide film27 Nov 2025US 2025/0361599 A1JX Advanced Metals Corporation
Most cited
By later US patents
- Method and apparatus for ionized physical vapor deposition80US 6,287,435 B1Tokyo Electron Limited · 2001
- Method and apparatus for ionized physical vapor deposition71US 6,080,287 ATokyo Electron Limited · 2000
- Defect-mitigation layers in electrochromic devices70US 9,007,674 B2View, Inc. · 2015
- Apparatus for the reactive coating of a substrate68US 5,169,509 ALeybold Aktiengesellschaft · 1992
- Titanium-tungsten target material and manufacturing method thereof60US 5,306,569 AHitachi Metals, Ltd. · 1994