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US 12,595,548 B2Granted
Doped nickel oxide target and preparation method and application thereof
AssigneeContemporary Amperex Technology (Hong Kong) Limited
InventorsGuodong Chen, Weile Lin, Zhaohui Liu, Yongsheng Guo, Yandong Wang
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Abstract
A doped nickel oxide target includes a nickel oxide substrate and a dopant doped therein. The dopant includes at least one compound that contains one or more elements of Cu, Ca, Cr, Sn, Hg, Pb, Mg, Mn, Ag, Co, and Pr.
Claims11
A doped nickel oxide target, comprising:
- a nickel oxide substrate;
- and
- a dopant doped in the nickel oxide substrate, the dopant comprising at least one compound that contains one or more elements of Ca, Sn, Pb, and Pr, and the dopant comprising at least one compound of SnO, SnS, PbO, and Pr2O3.
A preparation method of a doped nickel oxide target, comprising:
- thermally spraying a coating for binding on a back panel or a back tube of a target;
- introducing nickel oxide powder and dopant powders into respective plasma generation sprayers;
- and
- simultaneously applying nickel oxide and dopant onto the back panel or the back tube of the target by plasma spraying, to obtain the doped nickel oxide target;
- wherein the dopant comprises at least one compound that contains one or more elements of Ca, Sn, Pb, and Pr.
2 more elements
A doped nickel oxide target, comprising:
- a nickel oxide substrate;
- and
- a dopant doped in the nickel oxide substrate, the dopant comprising at least one compound that contains one or more elements of Ca, Sn, Hg, Pb, Ag, Co, and Pr, and the at least one compound comprising a metal sulfide.
Dependencies are inferred from the claim text.