H01J 37/3426
Material
Official title: {Material}
H01J37/3426 (Material) appears on 791 US grants and 1,076 published applications in this corpus.
Search patents in H01J- Granted patents
- 791
- Published applications
- 1,076
- Assignees
- 337
- Inventors
- 1,954
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1977 | 1 | 0 |
| 1978 | 1 | 0 |
| 1979 | 2 | 0 |
| 1980 | 1 | 0 |
| 1981 | 0 | 0 |
| 1982 | 0 | 0 |
| 1983 | 8 | 0 |
| 1984 | 7 | 0 |
| 1985 | 1 | 0 |
| 1986 | 8 | 0 |
| 1987 | 1 | 0 |
| 1988 | 0 | 0 |
| 1989 | 5 | 0 |
| 1990 | 1 | 0 |
| 1991 | 1 | 0 |
| 1992 | 3 | 0 |
| 1993 | 5 | 0 |
| 1994 | 6 | 0 |
| 1995 | 9 | 0 |
| 1996 | 4 | 0 |
| 1997 | 7 | 0 |
| 1998 | 9 | 0 |
| 1999 | 5 | 0 |
| 2000 | 4 | 0 |
| 2001 | 13 | 2 |
| 2002 | 7 | 2 |
| 2003 | 6 | 9 |
| 2004 | 5 | 14 |
| 2005 | 3 | 10 |
| 2006 | 5 | 15 |
| 2007 | 2 | 12 |
| 2008 | 1 | 12 |
| 2009 | 2 | 26 |
| 2010 | 4 | 18 |
| 2011 | 5 | 27 |
| 2012 | 7 | 24 |
| 2013 | 15 | 47 |
| 2014 | 12 | 55 |
| 2015 | 34 | 113 |
| 2016 | 38 | 100 |
| 2017 | 68 | 113 |
| 2018 | 70 | 81 |
| 2019 | 75 | 56 |
| 2020 | 70 | 75 |
| 2021 | 44 | 61 |
| 2022 | 50 | 59 |
| 2023 | 52 | 47 |
| 2024 | 41 | 54 |
| 2025 | 47 | 27 |
| 2026 | 26 | 17 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Coated cutting tool with an alternating layer composition6 Oct 2026US 12,752,344 B2Walter AG
- Molybdenum sputtering target assembly and method of making11 Aug 2026US 12,703,907 B2Solstice Advanced Materials US, Inc.
- Film formation apparatus and film formation method of gallium nitride film11 Aug 2026US 12,703,910 B2Japan Display Inc.
- Particle removal during fabrication of electrochromic devices4 Aug 2026US 12,699,296 B2View Operating Corporation
- Method for manufacturing multilayer structure28 Jul 2026US 12,692,589 B2Inha University Research and Business Foundation
- Method for producing transparent conductive coatings for emi protection using hipims8 Oct 2026US 2026/0308745 A1Raytheon Company
- In situ and tunable deposition of a film1 Oct 2026US 2026/0297727 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Ion beam deposition system for a low resistivity metal17 Sep 2026US 2026/0275498 A1Veeco Instruments Inc.
- Doped nickel oxide target and preparation method and application thereof16 Jul 2026US 2026/0201542 A1Contemporary Amperex Technology (Hong Kong) Limited
- Method for Improving Deposition Process16 Jul 2026US 2026/0204528 A1Taiwan Semiconductor Manufacturing Company.Ltd
Most cited
By later US patents
- Sputtering of lithium229US 6,039,850 AMinnesota Mining and Manufacturing Company · 2000
- Cathode arrangement for sputtering material from a target in a cathode sputtering unit142US 4,448,653 ABalzers Aktiengesellschaft · 1984
- Electrochromic devices110US 8,582,193 B2View, Inc. · 2013
- Method and apparatus for ionized physical vapor deposition80US 6,287,435 B1Tokyo Electron Limited · 2001
- Method and apparatus for sputtering of a liquid71US 5,211,824 ASiemens Solar Industries, L. P. · 1993