H01J 37/32183
Matching circuits
Official title: {Matching circuits}
H01J37/32183 (Matching circuits) appears on 1,253 US grants and 1,730 published applications in this corpus.
Search patents in H01J- Granted patents
- 1,253
- Published applications
- 1,730
- Assignees
- 193
- Inventors
- 2,062
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1980 | 1 | 0 |
| 1981 | 0 | 0 |
| 1982 | 0 | 0 |
| 1983 | 0 | 0 |
| 1984 | 0 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 1 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 1 | 0 |
| 1991 | 1 | 0 |
| 1992 | 0 | 0 |
| 1993 | 1 | 0 |
| 1994 | 1 | 0 |
| 1995 | 6 | 0 |
| 1996 | 4 | 0 |
| 1997 | 1 | 0 |
| 1998 | 2 | 0 |
| 1999 | 3 | 0 |
| 2000 | 6 | 0 |
| 2001 | 4 | 0 |
| 2002 | 4 | 11 |
| 2003 | 7 | 18 |
| 2004 | 11 | 20 |
| 2005 | 12 | 24 |
| 2006 | 16 | 9 |
| 2007 | 14 | 18 |
| 2008 | 3 | 17 |
| 2009 | 6 | 15 |
| 2010 | 5 | 20 |
| 2011 | 10 | 22 |
| 2012 | 15 | 23 |
| 2013 | 18 | 31 |
| 2014 | 20 | 47 |
| 2015 | 41 | 57 |
| 2016 | 47 | 63 |
| 2017 | 65 | 87 |
| 2018 | 63 | 77 |
| 2019 | 92 | 113 |
| 2020 | 107 | 139 |
| 2021 | 102 | 135 |
| 2022 | 96 | 141 |
| 2023 | 105 | 161 |
| 2024 | 135 | 153 |
| 2025 | 138 | 188 |
| 2026 | 89 | 141 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Pulsed voltage waveform with binary pulses for biasing of plasma6 Oct 2026US 12,755,934 B2APPLIED Materials.Inc.
- Process control for ion energy delivery using multiple generators and phase control6 Oct 2026US 12,755,935 B2Lam Research Corporation
- Semiconductor processing equipment and impedance-matching method29 Sep 2026US 12,749,654 B2Beijing Naura Microelectronics Equipment Co., Ltd.
- Splitter circuit for wafer processing system29 Sep 2026US 12,749,655 B2APPLIED Materials.Inc.
- Substrate processing apparatus, method of manufacturing semiconductor device and plasma generating apparatus22 Sep 2026US 12,744,182 B2Kokusai Electric Corporation
- Rf impedance matching network8 Oct 2026US 2026/0311968 A1ASM America, Inc.
- Rf impedance matching network with series-connected diode switches1 Oct 2026US 2026/0302137 A1ASM America, Inc.
- Impedance matcher1 Oct 2026US 2026/0303052 A1DAIHEN Corporation
- High frequency power supply system1 Oct 2026US 2026/0303053 A1DAIHEN Corporation
- Power delivery to a plasma via inductive coupling24 Sep 2026US 2026/0290751 A1AES Global Holdings PTE Ltd.
Most cited
By later US patents
- Plasma monitoring and control method and system625US 5,576,629 AFourth State Technology, Inc. · 1996
- Plasma monitoring and control method and system503US 5,939,886 AAdvanced Energy Industries, Inc. · 1999
- Automatic impedance matching apparatus and method281US 5,195,045 AASTEC America, Inc. · 1993
- Plasma reactor with overhead RF electrode tuned to the plasma203US 6,528,751 B1APPLIED Materials.Inc. · 2003
- RF impedance matching network198US 9,306,533 B1Reno Technologies, Inc. · 2016