H01J 37/32165
Plural frequencies
Official title: {Plural frequencies}
H01J37/32165 (Plural frequencies) appears on 736 US grants and 925 published applications in this corpus.
Search patents in H01J- Granted patents
- 736
- Published applications
- 925
- Assignees
- 134
- Inventors
- 1,587
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1984 | 1 | 0 |
| 1985 | 0 | 0 |
| 1986 | 7 | 0 |
| 1987 | 0 | 0 |
| 1988 | 1 | 0 |
| 1989 | 4 | 0 |
| 1990 | 3 | 0 |
| 1991 | 2 | 0 |
| 1992 | 4 | 0 |
| 1993 | 4 | 0 |
| 1994 | 7 | 0 |
| 1995 | 5 | 0 |
| 1996 | 8 | 0 |
| 1997 | 7 | 0 |
| 1998 | 11 | 0 |
| 1999 | 8 | 0 |
| 2000 | 25 | 0 |
| 2001 | 16 | 12 |
| 2002 | 24 | 15 |
| 2003 | 15 | 13 |
| 2004 | 11 | 15 |
| 2005 | 9 | 21 |
| 2006 | 7 | 12 |
| 2007 | 5 | 34 |
| 2008 | 6 | 38 |
| 2009 | 7 | 23 |
| 2010 | 14 | 27 |
| 2011 | 19 | 42 |
| 2012 | 16 | 17 |
| 2013 | 25 | 25 |
| 2014 | 20 | 37 |
| 2015 | 24 | 42 |
| 2016 | 34 | 36 |
| 2017 | 39 | 54 |
| 2018 | 41 | 39 |
| 2019 | 44 | 48 |
| 2020 | 42 | 39 |
| 2021 | 32 | 40 |
| 2022 | 28 | 43 |
| 2023 | 29 | 68 |
| 2024 | 51 | 58 |
| 2025 | 41 | 70 |
| 2026 | 40 | 57 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Process control for ion energy delivery using multiple generators and phase control6 Oct 2026US 12,755,935 B2Lam Research Corporation
- Plasma processing apparatus8 Sep 2026US 12,731,761 B2Tokyo Electron Limited
- Method for plasma processing8 Sep 2026US 12,731,762 B2Tokyo Electron Limited
- Substrate processing method and substrate processing apparatus8 Sep 2026US 12,731,765 B2Tokyo Electron Limited
- Plasma processing method and plasma processing apparatus25 Aug 2026US 12,719,019 B2Tokyo Electron Limited
- Process reactor and method for producing structures on a substrate10 Sep 2026US 2026/0265911 A1
- Parts with embedded channels for semiconductor manufacturing systems10 Sep 2026US 2026/0269188 A1Lam Research Corporation
- Plasma processing apparatus3 Sep 2026US 2026/0260854 A1Tokyo Electron Limited
- Plasma processing apparatus and shower head27 Aug 2026US 2026/0253843 A1Tokyo Electron Limited
- System and Method for Atomic Layer Etching Using an Added Sidewall Coil in Proximity to a Chuck for Substrate Edge Uniformity Control13 Aug 2026US 2026/0237604 A1Inspiring Atoms Pte Ltd
Most cited
By later US patents
- Pulsed dual radio frequency CVD process568US 4,837,185 AIntel Corporation · 1989
- Parallel plate electrode plasma reactor having an inductive antenna and adjustable radial distribution of plasma ion density523US 6,054,013 AAPPLIED Materials.Inc. · 2000
- Vacuum processing chamber having multi-mode access485US 6,095,083 AApplied Materiels, Inc. · 2000
- Method for forming film by plasma-assisted deposition using two-frequency combined pulsed RF power469US 9,365,924 B2ASM IP Holding B. V. · 2016
- Plasma reactor apparatus402US 4,579,618 ATegal Corporation · 1986