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US 12,731,762 B2Granted
Method for plasma processing
AssigneeTokyo Electron Limited
InventorsJustin Moses, Merritt Funk, Chelsea DuBose, Barton Lane
Life of this patent
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Abstract
A method for multitone plasma processing includes providing a substrate into a plasma processing chamber, igniting a plasma in the plasma processing chamber with a multitone signal, and performing a first plasma process on the substrate with the plasma. The multitone signal includes a first tone and a second tone.
Claims20
A method for processing a substrate, the method comprising:
- providing a substrate into a plasma processing chamber;
- igniting a plasma in the plasma processing chamber with a multitone signal, the multitone signal comprising a first tone and a second tone, at least the first tone having a frequency that is not a fundamental frequency of the multitone signal nor a frequency of a harmonic of the fundamental frequency;
- and
- performing a plasma process on the substrate with the plasma, the plasma having a first resonant frequency during a first plasma process, wherein a width in frequency between the first tone and the fundamental frequency is less than 1% to 99% of the fundamental frequency.
1 more element
A method for plasma processing, the method comprising:
- providing a multitone signal to an antenna system comprising a first resonance and a second resonance, the multitone signal comprising a first tone driving the first resonance, a second tone driving the second resonance, and a fundamental frequency of the multitone signal balancing an output between the first resonance and the second resonance;
- igniting a plasma in a plasma chamber with the antenna system;
- and
- performing a plasma process in the plasma chamber.
1 more element
A method for multitone tuning, the method comprising:
- lighting a plasma in a plasma processing system with a multitone signal;
- controlling a fundamental frequency of the multitone signal;
- monitoring a full bandwidth of a feedback signal of the plasma processing system;
- shifting the fundamental frequency in response to analysis of the feedback signal;
- and
- after determining that the fundamental frequency is at a desired frequency, maintaining the fundamental frequency of the multitone signal while set conditions of the plasma are unchanged and monitoring the feedback signal for changes.
3 more elements
Dependencies are inferred from the claim text.