Plasma processing apparatus

A plasma processing apparatus comprising:

• a chamber providing a processing space;
• a substrate support provided inside the processing space;
• a first electrode provided above the processing space;
• a second electrode provided above the processing space and below the first electrode, the second electrode providing a plasma generation space between the first electrode and the second electrode and providing a plurality of through-holes to guide active species generated in the plasma generation space into the processing space;
• an introducer made of a dielectric material and provided between the first electrode and the second electrode to introduce electromagnetic waves into the plasma generation space;
• and
• a resonator including a waveguide for propagation of the electromagnetic waves to the introducer,
• wherein the waveguide has a length longer than ½ of a wavelength of the electromagnetic waves in the waveguide;
• and
• wherein the electromagnetic waves are radio-frequency waves including VHF waves or UHF waves.