H01J 37/3178
For applying thin layers on objects
Official title: {for applying thin layers on objects}
H01J37/3178 (For applying thin layers on objects) appears on 212 US grants and 208 published applications in this corpus.
Search patents in H01J- Granted patents
- 212
- Published applications
- 208
- Assignees
- 139
- Inventors
- 612
- Latest grant
- 28 Jul 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 1 | 0 |
| 1977 | 0 | 0 |
| 1978 | 0 | 0 |
| 1979 | 2 | 0 |
| 1980 | 0 | 0 |
| 1981 | 0 | 0 |
| 1982 | 0 | 0 |
| 1983 | 1 | 0 |
| 1984 | 0 | 0 |
| 1985 | 3 | 0 |
| 1986 | 1 | 0 |
| 1987 | 3 | 0 |
| 1988 | 1 | 0 |
| 1989 | 3 | 0 |
| 1990 | 2 | 0 |
| 1991 | 2 | 0 |
| 1992 | 7 | 0 |
| 1993 | 2 | 0 |
| 1994 | 5 | 0 |
| 1995 | 2 | 0 |
| 1996 | 2 | 0 |
| 1997 | 1 | 0 |
| 1998 | 3 | 0 |
| 1999 | 2 | 0 |
| 2000 | 6 | 0 |
| 2001 | 5 | 3 |
| 2002 | 8 | 4 |
| 2003 | 3 | 4 |
| 2004 | 3 | 9 |
| 2005 | 8 | 1 |
| 2006 | 1 | 2 |
| 2007 | 0 | 3 |
| 2008 | 4 | 7 |
| 2009 | 1 | 6 |
| 2010 | 1 | 12 |
| 2011 | 5 | 5 |
| 2012 | 4 | 4 |
| 2013 | 10 | 8 |
| 2014 | 4 | 8 |
| 2015 | 9 | 23 |
| 2016 | 9 | 11 |
| 2017 | 16 | 24 |
| 2018 | 9 | 9 |
| 2019 | 14 | 8 |
| 2020 | 12 | 13 |
| 2021 | 5 | 8 |
| 2022 | 9 | 2 |
| 2023 | 5 | 10 |
| 2024 | 5 | 12 |
| 2025 | 10 | 6 |
| 2026 | 3 | 6 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Ion beam deposition apparatus and ion beam deposition method using the same28 Jul 2026US 12,695,049 B2Samsung Electronics Co., Ltd.
- Method for preparing TEM sample17 Mar 2026US 12,580,151 B2Shanghai Huali Integrated Circuit Corporation
- Method and apparatus for mask repair27 Jan 2026US 12,535,729 B2Carl Zeiss SMT GmbH
- Metal pattern inspection method and focused ion beam apparatus28 Oct 2025US 12,456,599 B2V Technology Co., Ltd.
- Method for manufacturing a laminated body7 Oct 2025US 12,438,075 B2Canon Anelva Corporation
- Charged particle beam device and deposition method17 Sep 2026US 2026/0279725 A1Kioxia Corporation
- Method and device for correcting an imaging error of a particle beam during sample processing23 Jul 2026US 2026/0213126 A1
- Ion traps with slanted holes in substrate processing systems28 May 2026US 2026/0146323 A1ASM IP Holding B. V.
- Lamella hole trench fill method14 May 2026US 2026/0135062 A1FEI Company
- Method for depositing a coating in process chambers26 Feb 2026US 2026/0058094 A1APPLIED Materials.Inc.
Most cited
By later US patents
- Neutral particle beam processing apparatus423US 6,861,642 B2Ebara Corporation · 2005
- Low energy, steered ion beam deposition system having high current at low pressure116US 5,206,516 AInternational Business Machines Corporation · 1993
- Film deposition111US 3,961,103 ASpace Sciences Corporation · 1976
- Chamber with flow-through source102US 9,934,942 B1APPLIED Materials.Inc. · 2018
- Gas delivery systems for particle beam processing95US 5,851,413 AMicrion Corporation · 1998