Film deposition
AssigneeSpace Sciences Corporation
InventorSol Aisenberg
Life of this patent
Estimating the term…
Abstract
A method and apparatus for depositing a thin film of material upon a base substrate including a glow discharge ion source for generating the particular ions that will be subsequently deposited upon the base substrate, a vacuum deposition chamber wherein the substrate material is located, and, intermediate between the glow discharge ion source and the vacuum deposition chamber, a constrictor electrode for isolating the deposition chamber from the ion chamber and an anode electrode for extracting ions from the glow discharge ion source and directing them toward the target substrate. A magnetic field is also provided in the apparatus of the present invention by the use of an externally wound magnetic coil to permit the glow discharge ion source to operate at a lower pressure and to constrict the flow of ions toward the substrate.
Claims22
A method for depositing a film on a substrate comprising the steps of:
- a. generating an energetic beam of gaseous ions, which may be of the same material as the film to be deposited, by means of a glow discharge ion source;
- b. producing a pressure differential between said glow discharge ion source and a deposition chamber containing therein the substrate on which the film is to be deposited together with a source of deposition atoms of the same material as the film to be deposited;
- and,
- c. directing said energetic beam of gaseous ions into said deposition chamber such that the beam of ions impinges concurrently upon the substrate and said source of deposition atoms and thereby deposits a film of the deposition material on the substrate.
A method for depositing a film on a substrate comprising the steps of:
- a. generating an energetic beam of gaseous ions in a gas-containing chamber by means of establishing a sufficient electrical potential between at least two spaced electrodes, of which at least one of said electrodes is at least partly formed of the material which is to be deposited, so as to cause a glow discharge therebetween which releases atoms of the material which is to be deposited from said electrode at least partly formed of said material and ionizes said released deposition material atoms to form ions thereof;
- b. producing a pressure differential between said gas-containing chamber and a deposition chamber containing therein the substrate on which the film is to be deposited;
- c. extracting said gaseous ions from said gas-containing chamber by means of an extraction electrode having an aperture disposed therein and containing said ions by means of an axial magnetic field between said gas-containing chamber and said deposition chamber with the axis of the magnetic field being substantially parallel to the axis of said extraction electrode aperture;
- and,
- d. accelerating at least some of said gaseous ions and directing them into said deposition chamber so as to impinge upon said substrate thereby depositing a film on the substrate.
A method for depositing a film on a substrate comprising the steps of:
- a. generating an energetic beam of gaseous ions in a gas-containing chamber, wherein said chamber contains at least one gas capable of supplying a portion of the material which is to be deposited, by means of establishing a sufficient electrical potential between at least two spaced electrodes so as to cause a glow discharge therebetween which ionizes said gas capable of supplying a portion of the material which is to be deposited to form ions thereof;
- b. producing a pressure differential between said gas-containing chamber and a deposition chamber containing therein the substrate on which the film is to be deposited;
- c. extracting said gaseous ions from said gas-containing chamber by means of an extraction electrode having an aperture disposed therein and containing said ions by means of an axial magnetic field between said gas-containing chamber and said deposition chamber with the axis of the magnetic field being substantially parallel to the axis of said extraction electrode aperture;
- and,
- d. accelerating at least some of said gaseous ions and directing them into said deposition chamber so as to impinge upon said substrate thereby depositing a film on the substrate.
Dependencies are inferred from the claim text.