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US 12,695,049 B2Granted
Ion beam deposition apparatus and ion beam deposition method using the same
AssigneeSamsung Electronics Co., Ltd.
InventorsSeungWan Yoo, Jeongyeon Lee, Dohyung Kim, Jaehong Park, Dong-Chan Lim
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Abstract
An ion beam deposition method includes placing a substrate into an ion beam deposition apparatus, irradiating an ion beam from an ion beam source toward a target plate, and rotating the target plate during the irradiating of the ion beam. The target plate includes a first region that includes a first material, and a second region that includes a second material different from the first material.
Claims8
An ion beam deposition method comprising:
- placing a substrate into an ion beam deposition apparatus;
- irradiating an ion beam from an ion beam source toward a target plate;
- and
- rotating the target plate during the irradiating the ion beam,
- wherein the target plate includes a first region that includes a first material and a second region that includes a second material different from the first material,
- wherein each rotation of the target plate comprises irradiation of each of the first region and the second region by the ion beam, and
- wherein the rotating the target plate during the irradiating the ion beam comprises changing a rotation speed of the target plate.
4 more elements
Dependencies are inferred from the claim text.