H01J 37/317
For changing properties of the objects or for applying thin layers thereon
Official title: for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation (H01J37/36 takes precedence)
H01J37/317 (For changing properties of the objects or for applying thin layers thereon) appears on 4,846 US grants and 4,516 published applications in this corpus.
Search patents in H01J- Granted patents
- 4,846
- Published applications
- 4,516
- Assignees
- 772
- Inventors
- 5,586
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 7 | 0 |
| 1977 | 7 | 0 |
| 1978 | 7 | 0 |
| 1979 | 8 | 0 |
| 1980 | 6 | 0 |
| 1981 | 12 | 0 |
| 1982 | 10 | 0 |
| 1983 | 14 | 0 |
| 1984 | 23 | 0 |
| 1985 | 28 | 0 |
| 1986 | 25 | 0 |
| 1987 | 34 | 0 |
| 1988 | 30 | 0 |
| 1989 | 34 | 0 |
| 1990 | 34 | 0 |
| 1991 | 33 | 0 |
| 1992 | 52 | 0 |
| 1993 | 41 | 0 |
| 1994 | 49 | 0 |
| 1995 | 43 | 0 |
| 1996 | 27 | 0 |
| 1997 | 30 | 0 |
| 1998 | 74 | 0 |
| 1999 | 97 | 0 |
| 2000 | 92 | 0 |
| 2001 | 106 | 41 |
| 2002 | 120 | 138 |
| 2003 | 159 | 141 |
| 2004 | 145 | 155 |
| 2005 | 132 | 163 |
| 2006 | 159 | 182 |
| 2007 | 96 | 198 |
| 2008 | 147 | 232 |
| 2009 | 172 | 195 |
| 2010 | 187 | 193 |
| 2011 | 160 | 176 |
| 2012 | 155 | 183 |
| 2013 | 194 | 217 |
| 2014 | 211 | 236 |
| 2015 | 205 | 284 |
| 2016 | 224 | 203 |
| 2017 | 229 | 195 |
| 2018 | 169 | 162 |
| 2019 | 202 | 163 |
| 2020 | 174 | 189 |
| 2021 | 139 | 132 |
| 2022 | 117 | 135 |
| 2023 | 136 | 148 |
| 2024 | 96 | 162 |
| 2025 | 104 | 167 |
| 2026 | 91 | 126 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- E-beam exposure method and mask manufacturing method comprising the same6 Oct 2026US 12,755,931 B2Samsung Electronics Co., Ltd.
- Ion implanter and linear accelerator having polygonal backbone29 Sep 2026US 12,750,942 B2APPLIED Materials.Inc.
- Electron beam apparatus, inspection tool and inspection method22 Sep 2026US 12,744,181 B2ASML Netherlands B. V.
- Electron beam additive manufacturing system and control components15 Sep 2026US 12,734,582 B2Sciaky, Inc.
- Method for determining focal properties in a target beam field of a multi-beam charged-particle processing apparatus15 Sep 2026US 12,738,453 B2IMS Nanofabrication GmbH
- Semiconductor apparatus and method of operating the same8 Oct 2026US 2026/0310069 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Ion generators of ion implanters with movable repeller8 Oct 2026US 2026/0311954 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Ion implanter and ion implantation method8 Oct 2026US 2026/0311963 A1Chongqing Advanced Silicon Technology Co., LTD
- Apparatus and method for repairing defect of semiconductor8 Oct 2026US 2026/0311964 A1Tokyo Electron Limited
- Ion source and ion implanter having ion source1 Oct 2026US 2026/0302124 A1Nissin Ion Equipment Co., Ltd.
Most cited
By later US patents
- Particle-optical projection system1,466US 7,388,217 B2IMS Nanofabrication GmbH · 2008
- Position measurement apparatus and method and pattern forming apparatus and writing method551US 7,640,142 B2NuFlare Technology, Inc. · 2009
- Neutral particle beam processing apparatus423US 6,861,642 B2Ebara Corporation · 2005
- Method and apparatus for in situ anneal during ion implant283US 6,111,260 AAdvanced Micro Devices, Inc. · 2000
- Laser stimulated high current density photoelectron generator and method of manufacture235US 4,460,831 AThermo Electron Corporation · 1984