H01J 37/3171
For ion implantation
Official title: {for ion implantation}
H01J37/3171 (For ion implantation) appears on 1,885 US grants and 1,831 published applications in this corpus.
Search patents in H01J- Granted patents
- 1,885
- Published applications
- 1,831
- Assignees
- 317
- Inventors
- 2,211
- Latest grant
- 29 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 3 | 0 |
| 1977 | 4 | 0 |
| 1978 | 4 | 0 |
| 1979 | 5 | 0 |
| 1980 | 4 | 0 |
| 1981 | 6 | 0 |
| 1982 | 2 | 0 |
| 1983 | 7 | 0 |
| 1984 | 7 | 0 |
| 1985 | 9 | 0 |
| 1986 | 10 | 0 |
| 1987 | 13 | 0 |
| 1988 | 16 | 0 |
| 1989 | 14 | 0 |
| 1990 | 14 | 0 |
| 1991 | 14 | 0 |
| 1992 | 22 | 0 |
| 1993 | 12 | 0 |
| 1994 | 15 | 0 |
| 1995 | 15 | 0 |
| 1996 | 9 | 0 |
| 1997 | 8 | 0 |
| 1998 | 19 | 0 |
| 1999 | 24 | 0 |
| 2000 | 17 | 0 |
| 2001 | 33 | 6 |
| 2002 | 34 | 35 |
| 2003 | 50 | 41 |
| 2004 | 57 | 49 |
| 2005 | 39 | 65 |
| 2006 | 64 | 80 |
| 2007 | 37 | 87 |
| 2008 | 65 | 119 |
| 2009 | 81 | 91 |
| 2010 | 89 | 79 |
| 2011 | 76 | 86 |
| 2012 | 60 | 66 |
| 2013 | 68 | 69 |
| 2014 | 74 | 89 |
| 2015 | 77 | 103 |
| 2016 | 94 | 70 |
| 2017 | 89 | 70 |
| 2018 | 63 | 62 |
| 2019 | 75 | 65 |
| 2020 | 79 | 84 |
| 2021 | 65 | 62 |
| 2022 | 49 | 63 |
| 2023 | 61 | 57 |
| 2024 | 44 | 71 |
| 2025 | 46 | 95 |
| 2026 | 43 | 67 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Ion implanter and linear accelerator having polygonal backbone29 Sep 2026US 12,750,942 B2APPLIED Materials.Inc.
- Energy filter assembly for ion implantation system with at least one coupling element8 Sep 2026US 12,731,753 B2Mi2-Factory GmbH
- Captive spring hooks for reduced electrostatic stress1 Sep 2026US 12,725,754 B2APPLIED Materials.Inc.
- Oblique angled ion implantation for substrate stress control1 Sep 2026US 12,725,758 B2APPLIED Materials.Inc.
- Large-area wafer-scale CMOS-compatible 2D-material intercalation doping tools, processes, and methods, including doping of synthesized graphene1 Sep 2026US 12,727,408 B2Destination 2D Inc.
- Ion generators of ion implanters with movable repeller8 Oct 2026US 2026/0311954 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Ion implanter and ion implantation method8 Oct 2026US 2026/0311963 A1Chongqing Advanced Silicon Technology Co., LTD
- Apparatus and method for repairing defect of semiconductor8 Oct 2026US 2026/0311964 A1Tokyo Electron Limited
- Ion source and ion implanter having ion source1 Oct 2026US 2026/0302124 A1Nissin Ion Equipment Co., Ltd.
- System and Method for Extending Faraday Setup Cup Life Time by Scanning Ion Beam during Setup1 Oct 2026US 2026/0302125 A1APPLIED Materials.Inc.
Most cited
By later US patents
- Method and apparatus for in situ anneal during ion implant283US 6,111,260 AAdvanced Micro Devices, Inc. · 2000
- System and method for magnetic scanning, accelerating, and implanting of an ion beam122US 5,483,077 ANissin Electric Co., Ltd. · 1996
- Compact high current broad beam ion implanter103US 5,350,926 ADiamond Semiconductor Group, Inc. · 1994
- Apparatus and methods for ion implantation94US 4,578,589 AAPPLIED Materials.Inc. · 1986
- Ion beam scanning method and apparatus93US 4,922,106 AVarian Associates, Inc. · 1990