H01J 37/3172
Maskless patterned ion implantation
Official title: {Maskless patterned ion implantation}
H01J37/3172 (Maskless patterned ion implantation) appears on 82 US grants and 66 published applications in this corpus.
Search patents in H01J- Granted patents
- 82
- Published applications
- 66
- Assignees
- 35
- Inventors
- 134
- Latest grant
- 1 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1978 | 1 | 0 |
| 1979 | 0 | 0 |
| 1980 | 0 | 0 |
| 1981 | 0 | 0 |
| 1982 | 0 | 0 |
| 1983 | 0 | 0 |
| 1984 | 1 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 2 | 0 |
| 1988 | 0 | 0 |
| 1989 | 1 | 0 |
| 1990 | 3 | 0 |
| 1991 | 1 | 0 |
| 1992 | 1 | 0 |
| 1993 | 1 | 0 |
| 1994 | 0 | 0 |
| 1995 | 1 | 0 |
| 1996 | 0 | 0 |
| 1997 | 0 | 0 |
| 1998 | 0 | 0 |
| 1999 | 0 | 0 |
| 2000 | 0 | 0 |
| 2001 | 0 | 0 |
| 2002 | 0 | 0 |
| 2003 | 0 | 0 |
| 2004 | 0 | 0 |
| 2005 | 0 | 3 |
| 2006 | 2 | 1 |
| 2007 | 1 | 14 |
| 2008 | 3 | 5 |
| 2009 | 12 | 2 |
| 2010 | 4 | 2 |
| 2011 | 2 | 2 |
| 2012 | 2 | 6 |
| 2013 | 2 | 3 |
| 2014 | 6 | 5 |
| 2015 | 5 | 4 |
| 2016 | 5 | 1 |
| 2017 | 7 | 2 |
| 2018 | 4 | 1 |
| 2019 | 0 | 3 |
| 2020 | 6 | 1 |
| 2021 | 2 | 2 |
| 2022 | 1 | 2 |
| 2023 | 2 | 1 |
| 2024 | 2 | 3 |
| 2025 | 0 | 3 |
| 2026 | 2 | 0 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Oblique angled ion implantation for substrate stress control1 Sep 2026US 12,725,758 B2APPLIED Materials.Inc.
- Filament alignment device21 Apr 2026US 12,609,281 B2Samsung Electronics Co., Ltd.
- Energy filter element for ion implantation systems for the use in the production of wafers3 Sep 2024US 12,080,510 B2Mi2-Factory GmbH
- Method for manufacturing semiconductor structure20 Feb 2024US 11,908,700 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Energy filter element for ion implantation systems for the use in the production of wafers5 Dec 2023US 11,837,430 B2Mi2-Factory GmbH
- Resonator, linear accelerator configuration and ion implantation system having tapered resonator6 Nov 2025US 2025/0343023 A1APPLIED Materials.Inc.
- High bandwidth variable dose ion implantation system and method22 May 2025US 2025/0166959 A1Axcelis Technologies, Inc.
- Energy filter element for ion implantation systems for the use in the production of wafers9 Jan 2025US 2025/0014854 A1Mi2-Factory GmbH
- Oblique angled ion implantation for substrate stress control28 Nov 2024US 2024/0395500 A1APPLIED Materials.Inc.
- Filament alignment device9 May 2024US 2024/0153740 A1Samsung Electronics Co., Ltd.
Most cited
By later US patents
- Apparatus and method for maskless ion implantation77US 4,074,139 ARCA Corporation · 1978
- Apparatus and method for controlled particle beam manufacturing33US 7,259,373 B2NexGenSemi Holdings Corporation · 2007
- Treating work pieces with electro-magnetically scanned ion beams32US 4,804,852 AEaton Corporation · 1989
- Charged particle beam pattern generation apparatus and method28US 5,149,976 AHughes Aircraft Company · 1992
- Apparatus and method for controlled particle beam manufacturing22US 7,659,526 B2NexGen Semi Holding, Inc. · 2010