H01J 37/3174
Particle-beam lithography
Official title: {Particle-beam lithography, e.g. electron beam lithography}
H01J37/3174 (Particle-beam lithography) appears on 2,559 US grants and 2,249 published applications in this corpus.
Search patents in H01J- Granted patents
- 2,559
- Published applications
- 2,249
- Assignees
- 381
- Inventors
- 2,590
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1977 | 2 | 0 |
| 1978 | 3 | 0 |
| 1979 | 3 | 0 |
| 1980 | 2 | 0 |
| 1981 | 5 | 0 |
| 1982 | 8 | 0 |
| 1983 | 5 | 0 |
| 1984 | 14 | 0 |
| 1985 | 14 | 0 |
| 1986 | 12 | 0 |
| 1987 | 17 | 0 |
| 1988 | 12 | 0 |
| 1989 | 17 | 0 |
| 1990 | 17 | 0 |
| 1991 | 16 | 0 |
| 1992 | 22 | 0 |
| 1993 | 25 | 0 |
| 1994 | 26 | 0 |
| 1995 | 26 | 0 |
| 1996 | 15 | 0 |
| 1997 | 20 | 0 |
| 1998 | 50 | 0 |
| 1999 | 70 | 0 |
| 2000 | 69 | 0 |
| 2001 | 66 | 32 |
| 2002 | 74 | 91 |
| 2003 | 101 | 91 |
| 2004 | 80 | 87 |
| 2005 | 79 | 89 |
| 2006 | 90 | 91 |
| 2007 | 57 | 114 |
| 2008 | 71 | 104 |
| 2009 | 93 | 95 |
| 2010 | 96 | 94 |
| 2011 | 78 | 78 |
| 2012 | 85 | 105 |
| 2013 | 111 | 131 |
| 2014 | 124 | 118 |
| 2015 | 107 | 139 |
| 2016 | 112 | 101 |
| 2017 | 101 | 84 |
| 2018 | 85 | 78 |
| 2019 | 102 | 78 |
| 2020 | 72 | 78 |
| 2021 | 63 | 54 |
| 2022 | 52 | 65 |
| 2023 | 64 | 75 |
| 2024 | 41 | 73 |
| 2025 | 44 | 61 |
| 2026 | 41 | 43 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- E-beam exposure method and mask manufacturing method comprising the same6 Oct 2026US 12,755,931 B2Samsung Electronics Co., Ltd.
- Electron beam apparatus, inspection tool and inspection method22 Sep 2026US 12,744,181 B2ASML Netherlands B. V.
- Method for determining focal properties in a target beam field of a multi-beam charged-particle processing apparatus15 Sep 2026US 12,738,453 B2IMS Nanofabrication GmbH
- Beam detector, multi-charged-particle-beam irradiation apparatus, and adjustment method for beam detector8 Sep 2026US 12,731,759 B2NuFlare Technology, Inc.
- High-density implantable neural probes1 Sep 2026US 12,724,041 B2Carnegie Mellon University
- Semiconductor apparatus and method of operating the same8 Oct 2026US 2026/0310069 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Dose information correction method, dose information acquisition method for edge peripheral region of figure pattern, charged particle beam writing apparatus, and non-transitory computer-readable storage medium storing program1 Oct 2026US 2026/0302132 A1NuFlare Technology, Inc.
- Charged particle beam writing method, charged particle beam writing apparatus and computer-readable recording medium17 Sep 2026US 2026/0279724 A1NuFlare Technology, Inc.
- Multi-charged particle beam irradiation apparatus and alignment method27 Aug 2026US 2026/0253836 A1NuFlare Technology, Inc.
- Charged particle beam writing apparatus, drift amount calculation method, and charged particle beam writing method20 Aug 2026US 2026/0245830 A1NuFlare Technology, Inc.
Most cited
By later US patents
- Particle-optical projection system1,466US 7,388,217 B2IMS Nanofabrication GmbH · 2008
- Position measurement apparatus and method and pattern forming apparatus and writing method551US 7,640,142 B2NuFlare Technology, Inc. · 2009
- Laser stimulated high current density photoelectron generator and method of manufacture235US 4,460,831 AThermo Electron Corporation · 1984
- Diaphragm system for generating a plurality of particle probes haivng variable cross section151US 4,899,060 ASiemens Aktiengesellschaft · 1990
- Energy beam exposure method and exposure apparatus143US 6,897,454 B2Kabushiki Kaisha Toshiba · 2005