H01J 37/3177
Multi-beam
Official title: {Multi-beam, e.g. fly's eye, comb probe}
H01J37/3177 (Multi-beam) appears on 798 US grants and 898 published applications in this corpus.
Search patents in H01J- Granted patents
- 798
- Published applications
- 898
- Assignees
- 109
- Inventors
- 850
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1978 | 1 | 0 |
| 1979 | 1 | 0 |
| 1980 | 1 | 0 |
| 1981 | 0 | 0 |
| 1982 | 2 | 0 |
| 1983 | 3 | 0 |
| 1984 | 4 | 0 |
| 1985 | 1 | 0 |
| 1986 | 1 | 0 |
| 1987 | 3 | 0 |
| 1988 | 2 | 0 |
| 1989 | 2 | 0 |
| 1990 | 5 | 0 |
| 1991 | 5 | 0 |
| 1992 | 1 | 0 |
| 1993 | 2 | 0 |
| 1994 | 2 | 0 |
| 1995 | 0 | 0 |
| 1996 | 1 | 0 |
| 1997 | 1 | 0 |
| 1998 | 1 | 0 |
| 1999 | 6 | 0 |
| 2000 | 10 | 0 |
| 2001 | 3 | 7 |
| 2002 | 7 | 6 |
| 2003 | 9 | 21 |
| 2004 | 17 | 26 |
| 2005 | 22 | 19 |
| 2006 | 23 | 19 |
| 2007 | 10 | 23 |
| 2008 | 18 | 15 |
| 2009 | 16 | 13 |
| 2010 | 11 | 12 |
| 2011 | 7 | 17 |
| 2012 | 18 | 46 |
| 2013 | 33 | 62 |
| 2014 | 54 | 58 |
| 2015 | 53 | 74 |
| 2016 | 61 | 56 |
| 2017 | 55 | 53 |
| 2018 | 58 | 42 |
| 2019 | 50 | 40 |
| 2020 | 42 | 46 |
| 2021 | 37 | 30 |
| 2022 | 26 | 37 |
| 2023 | 34 | 48 |
| 2024 | 23 | 50 |
| 2025 | 29 | 46 |
| 2026 | 27 | 32 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- E-beam exposure method and mask manufacturing method comprising the same6 Oct 2026US 12,755,931 B2Samsung Electronics Co., Ltd.
- Electron beam apparatus, inspection tool and inspection method22 Sep 2026US 12,744,181 B2ASML Netherlands B. V.
- Method for determining focal properties in a target beam field of a multi-beam charged-particle processing apparatus15 Sep 2026US 12,738,453 B2IMS Nanofabrication GmbH
- Charged-particle optical device18 Aug 2026US 12,712,147 B2ASML Netherlands B. V.
- Adjustable permanent magnetic lens having thermal control device11 Aug 2026US 12,706,270 B2IMS Nanofabrication GmbH
- Charged particle beam writing method, charged particle beam writing apparatus and computer-readable recording medium17 Sep 2026US 2026/0279724 A1NuFlare Technology, Inc.
- Multi-charged particle beam irradiation apparatus and alignment method27 Aug 2026US 2026/0253836 A1NuFlare Technology, Inc.
- Multi-charged particle beam writing apparatus, data generation apparatus, complexity calculation apparatus, multi-charged particle beam writing method and data generation method6 Aug 2026US 2026/0229453 A1NuFlare Technology, Inc.
- Charged particle beam writing method and charged particle beam writing apparatus6 Aug 2026US 2026/0229454 A1NuFlare Technology, Inc.
- Multi-charged particle beam writing method, and non-transitory computer-readable storage medium storing a program6 Aug 2026US 2026/0229455 A1NuFlare Technology, Inc.
Most cited
By later US patents
- Particle-optical projection system1,466US 7,388,217 B2IMS Nanofabrication GmbH · 2008
- Diaphragm system for generating a plurality of particle probes haivng variable cross section151US 4,899,060 ASiemens Aktiengesellschaft · 1990
- Multi-beam modulator for a particle beam and use of the multi-beam modulator for the maskless structuring of a substrate138US 7,741,620 B2Vistec Electron Beam GmbH · 2010
- Charged particle beam exposure system and charged particle beam exposure method135US 5,260,579 AFujitsu Limited · 1993
- Apparatus for generating a plurality of beamlets112US 7,129,502 B2Mapper Lithography IP B.V. · 2006