H01J 37/3026
Patterning strategy
Official title: {Patterning strategy}
H01J37/3026 (Patterning strategy) appears on 514 US grants and 405 published applications in this corpus.
Search patents in H01J- Granted patents
- 514
- Published applications
- 405
- Assignees
- 105
- Inventors
- 649
- Latest grant
- 18 Aug 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1978 | 1 | 0 |
| 1979 | 1 | 0 |
| 1980 | 1 | 0 |
| 1981 | 5 | 0 |
| 1982 | 0 | 0 |
| 1983 | 0 | 0 |
| 1984 | 4 | 0 |
| 1985 | 6 | 0 |
| 1986 | 3 | 0 |
| 1987 | 0 | 0 |
| 1988 | 4 | 0 |
| 1989 | 4 | 0 |
| 1990 | 2 | 0 |
| 1991 | 4 | 0 |
| 1992 | 10 | 0 |
| 1993 | 12 | 0 |
| 1994 | 16 | 0 |
| 1995 | 5 | 0 |
| 1996 | 3 | 0 |
| 1997 | 5 | 0 |
| 1998 | 10 | 0 |
| 1999 | 23 | 0 |
| 2000 | 18 | 0 |
| 2001 | 19 | 5 |
| 2002 | 10 | 13 |
| 2003 | 15 | 14 |
| 2004 | 15 | 3 |
| 2005 | 5 | 11 |
| 2006 | 8 | 10 |
| 2007 | 6 | 13 |
| 2008 | 4 | 10 |
| 2009 | 15 | 6 |
| 2010 | 12 | 6 |
| 2011 | 5 | 13 |
| 2012 | 14 | 24 |
| 2013 | 20 | 28 |
| 2014 | 26 | 27 |
| 2015 | 21 | 30 |
| 2016 | 22 | 34 |
| 2017 | 29 | 35 |
| 2018 | 26 | 21 |
| 2019 | 36 | 16 |
| 2020 | 16 | 18 |
| 2021 | 11 | 11 |
| 2022 | 11 | 7 |
| 2023 | 11 | 19 |
| 2024 | 6 | 8 |
| 2025 | 8 | 11 |
| 2026 | 6 | 12 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Charged particle beam device and imaging method18 Aug 2026US 12,712,149 B2Hitachi High-Tech Corporation
- Method and system for determining a charged particle beam exposure for a local pattern density21 Jul 2026US 12,688,998 B2D2S, Inc.
- Charged particle beam writing method and charged particle beam writing apparatus16 Jun 2026US 12,658,405 B2NuFlare Technology, Inc.
- Correction of thermal expansion in a lithographic device26 May 2026US 12,638,783 B2IMS Nanofabrication GmbH
- Charged particle beam writing method and charged particle beam writing apparatus26 May 2026US 12,640,341 B2NuFlare Technology, Inc.
- Charged particle beam writing method, charged particle beam writing apparatus and computer-readable recording medium17 Sep 2026US 2026/0279724 A1NuFlare Technology, Inc.
- Multi-charged particle beam writing apparatus, data generation apparatus, complexity calculation apparatus, multi-charged particle beam writing method and data generation method6 Aug 2026US 2026/0229453 A1NuFlare Technology, Inc.
- Charged particle beam writing method and charged particle beam writing apparatus6 Aug 2026US 2026/0229454 A1NuFlare Technology, Inc.
- Multi-charged particle beam writing method, and non-transitory computer-readable storage medium storing a program6 Aug 2026US 2026/0229455 A1NuFlare Technology, Inc.
- Multi-charged particle beam writing method, multi-charged particle beam writing apparatus and computer readable recording medium16 Jul 2026US 2026/0204514 A1NuFlare Technology, Inc.
Most cited
By later US patents
- Method and apparatus for run-time correction of proximity effects in pattern generation125US 5,847,959 AEtec Systems, Inc. · 1998
- Multiphase printing for E-beam lithography110US 5,103,101 AEtec Systems, Inc. · 1992
- System and method for preparing shape data for proximity correction93US 5,432,714 AInternational Business Machines Corporation · 1995
- Electron beam exposure apparatus and method, and device manufacturing method80US 5,834,783 ACanon Kabushiki Kaisha · 1998
- Electron beam exposure apparatus and method of controlling same78US 5,905,267 ACanon Kabushiki Kaisha · 1999