H01J 37/3023
Program control
Official title: {Program control}
H01J37/3023 (Program control) appears on 770 US grants and 642 published applications in this corpus.
Search patents in H01J- Granted patents
- 770
- Published applications
- 642
- Assignees
- 166
- Inventors
- 1,070
- Latest grant
- 18 Aug 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 1 | 0 |
| 1977 | 1 | 0 |
| 1978 | 2 | 0 |
| 1979 | 3 | 0 |
| 1980 | 1 | 0 |
| 1981 | 5 | 0 |
| 1982 | 0 | 0 |
| 1983 | 1 | 0 |
| 1984 | 4 | 0 |
| 1985 | 6 | 0 |
| 1986 | 3 | 0 |
| 1987 | 0 | 0 |
| 1988 | 5 | 0 |
| 1989 | 6 | 0 |
| 1990 | 4 | 0 |
| 1991 | 6 | 0 |
| 1992 | 15 | 0 |
| 1993 | 13 | 0 |
| 1994 | 16 | 0 |
| 1995 | 6 | 0 |
| 1996 | 6 | 0 |
| 1997 | 8 | 0 |
| 1998 | 16 | 0 |
| 1999 | 27 | 0 |
| 2000 | 26 | 0 |
| 2001 | 26 | 6 |
| 2002 | 13 | 16 |
| 2003 | 19 | 18 |
| 2004 | 18 | 9 |
| 2005 | 13 | 26 |
| 2006 | 13 | 20 |
| 2007 | 15 | 20 |
| 2008 | 11 | 22 |
| 2009 | 25 | 13 |
| 2010 | 19 | 11 |
| 2011 | 8 | 18 |
| 2012 | 19 | 37 |
| 2013 | 29 | 36 |
| 2014 | 41 | 37 |
| 2015 | 30 | 45 |
| 2016 | 29 | 41 |
| 2017 | 43 | 49 |
| 2018 | 33 | 32 |
| 2019 | 54 | 30 |
| 2020 | 29 | 32 |
| 2021 | 20 | 22 |
| 2022 | 23 | 16 |
| 2023 | 17 | 29 |
| 2024 | 14 | 16 |
| 2025 | 13 | 22 |
| 2026 | 15 | 19 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Charged particle beam device and imaging method18 Aug 2026US 12,712,149 B2Hitachi High-Tech Corporation
- Method and apparatus for continuous chained energy ion implantation4 Aug 2026US 12,700,562 B2Axcelis Technologies, Inc.
- Optimizing image distortion in a multi beam charged particle processing apparatus28 Jul 2026US 12,695,055 B2IMS Nanofabrication GmbH
- Method and system for determining a charged particle beam exposure for a local pattern density21 Jul 2026US 12,688,998 B2D2S, Inc.
- Computer, program, and charged particle beam processing system14 Jul 2026US 12,683,119 B2Hitachi High-Tech Science Corporation
- Charged particle beam writing method, charged particle beam writing apparatus and computer-readable recording medium17 Sep 2026US 2026/0279724 A1NuFlare Technology, Inc.
- Method of configuring a charged particle beam system and charged particle beam system13 Aug 2026US 2026/0237599 A1ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH
- Charged particle beam device and method for controlling charged particle beam device6 Aug 2026US 2026/0229452 A1Hitachi High-Tech Analysis Corporation
- Multi-charged particle beam writing apparatus, data generation apparatus, complexity calculation apparatus, multi-charged particle beam writing method and data generation method6 Aug 2026US 2026/0229453 A1NuFlare Technology, Inc.
- Charged particle beam writing method and charged particle beam writing apparatus6 Aug 2026US 2026/0229454 A1NuFlare Technology, Inc.
Most cited
By later US patents
- Optical proximity correction method and apparatus293US 6,269,472 B1LSI Logic Corporation · 2001
- High yield reticle with proximity effect halos210US 6,968,527 B2Synopsys, Inc. · 2005
- Multijunction photovoltaic cells and panels using a silicon or silicon-germanium active substrate cell for space and terrestrial applications199US 6,340,788 B12002
- Method and apparatus for run-time correction of proximity effects in pattern generation125US 5,847,959 AEtec Systems, Inc. · 1998
- Multiphase printing for E-beam lithography110US 5,103,101 AEtec Systems, Inc. · 1992