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US 5,905,267 AGranted
Electron beam exposure apparatus and method of controlling same
AssigneeCanon Kabushiki Kaisha
InventorMasato Muraki
Life of this patent
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AssigneeCanon Kabushiki Kaisha
InventorMasato Muraki
Estimating the term…
A multi-electronic beam electron beam exposure apparatus in which the patterns exposed by electron beams can be connected with a high degree of reliability. An electron beam exposure method includes steps of causing a plurality of electron beams to impinge upon a substrate at positions that differ from one another, deflecting each electron beam in an element exposure area of each electron beam, wherein the element exposure area is decided by a deflector of the electron beams, and individually controlling irradiation of the substrate by the electron beams, whereby a pattern is exposed in a plurality of the element exposure areas on the substrate. The method further includes a step of controlling the plurality of electron beams by the deflector in such a manner that exposure areas overlap at portions where the element exposure areas are contiguous.
An electron beam exposure apparatus comprising a plurality of electron beam sources for irradiating a substrate with electron beams, displacing means for displacing irradiation positions of the electron beams which irradiate the substrate, and irradiation control means for individually controlling the irradiation of the substrate by the plurality of electron beams, said displacing means displacing the irradiation position of each electron beam in such a manner that a peripheral portion of an element exposure area corresponding to each electron beam source will overlap a peripheral portion of another element exposure area contiguous thereto.
A method of controlling an electron beam exposure apparatus having a plurality of electron beam sources for irradiating a substrate with electron beams, and displacing means for displacing irradiation positions of the electron beams which irradiate the substrate, said method comprising:
A computer readable program for controlling an electron beam exposure apparatus having a plurality of electron beam sources for irradiating a substrate with electron beams, and displacing means for displacing irradiation positions of the electron beams which irradiate the substrate, said program comprising:
A computer readable program for generating exposure control data for controlling an exposure operation by an electron beam exposure apparatus having a plurality of electron beam sources for irradiating a substrate with electron beams, displacing means for displacing irradiation positions of the electron beams which irradiate the substrate, and irradiation control means for individually controlling the irradiation of the substrate by the plurality of electron beams, said program comprising:
Dependencies are inferred from the claim text.