H01J 37/1477
Electrostatic
Official title: {electrostatic}
H01J37/1477 (Electrostatic) appears on 151 US grants and 150 published applications in this corpus.
Search patents in H01J- Granted patents
- 151
- Published applications
- 150
- Assignees
- 78
- Inventors
- 322
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 1 | 0 |
| 1977 | 0 | 0 |
| 1978 | 0 | 0 |
| 1979 | 0 | 0 |
| 1980 | 0 | 0 |
| 1981 | 0 | 0 |
| 1982 | 0 | 0 |
| 1983 | 1 | 0 |
| 1984 | 2 | 0 |
| 1985 | 2 | 0 |
| 1986 | 1 | 0 |
| 1987 | 1 | 0 |
| 1988 | 1 | 0 |
| 1989 | 2 | 0 |
| 1990 | 2 | 0 |
| 1991 | 4 | 0 |
| 1992 | 2 | 0 |
| 1993 | 1 | 0 |
| 1994 | 1 | 0 |
| 1995 | 1 | 0 |
| 1996 | 0 | 0 |
| 1997 | 2 | 0 |
| 1998 | 0 | 0 |
| 1999 | 2 | 0 |
| 2000 | 2 | 0 |
| 2001 | 0 | 1 |
| 2002 | 0 | 3 |
| 2003 | 4 | 1 |
| 2004 | 3 | 4 |
| 2005 | 4 | 3 |
| 2006 | 1 | 4 |
| 2007 | 2 | 6 |
| 2008 | 5 | 6 |
| 2009 | 4 | 4 |
| 2010 | 5 | 2 |
| 2011 | 3 | 3 |
| 2012 | 6 | 2 |
| 2013 | 1 | 1 |
| 2014 | 4 | 2 |
| 2015 | 3 | 6 |
| 2016 | 3 | 5 |
| 2017 | 7 | 5 |
| 2018 | 4 | 2 |
| 2019 | 6 | 11 |
| 2020 | 9 | 8 |
| 2021 | 6 | 11 |
| 2022 | 9 | 13 |
| 2023 | 7 | 13 |
| 2024 | 8 | 8 |
| 2025 | 8 | 15 |
| 2026 | 11 | 11 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Aberration correction systems and charged particle microscope systems including the same6 Oct 2026US 12,755,924 B2FEI Company
- Detector substrate for use in a charged particle multi-beam assessment tool11 Aug 2026US 12,706,272 B2ASML Netherlands B. V.
- Electrostatic mirror chromatic aberration correctors4 Aug 2026US 12,700,563 B2FEI Company
- Devices and methods for electrostatic ion beam deflection and filtration28 Jul 2026US 12,695,047 B1Clocktower Engineering Inc.
- Adjustable permanent magnetic lens having shunting device30 Jun 2026US 12,671,054 B2IMS Nanofabrication GmbH
- Scanning electron microscope and specimen observation method10 Sep 2026US 2026/0269169 A1Hitachi High-Tech Corporation
- System and method for adjusting an ion beam10 Sep 2026US 2026/0269182 A1APPLIED Materials.Inc.
- Multi-beam generating unit with increased focusing power30 Jul 2026US 2026/0221374 A1
- Multi-charged particle beam irradiation apparatus and multi-charged particle beam irradiation method23 Jul 2026US 2026/0213113 A1NuFlare Technology, Inc.
- Charged particle beam device23 Jul 2026US 2026/0213117 A1Hitachi High-Tech Corporation
Most cited
By later US patents
- Method for manufacturing a control plate for a lithographic device46US 4,994,336 ASiemens Aktiengesellschaft · 1991
- High throughput/high resolution particle beam system43US 4,445,039 AThe Perkin-Elmer Corporation · 1984
- Method and apparatus for ion beam scanning in an ion implanter39US 6,060,715 AAPPLIED Materials.Inc. · 2000
- Electron beam exposure apparatus, deflection apparatus, and electron beam exposure method36US 6,919,574 B2Advantest Corporation · 2005
- Parallel charged particle beam exposure system35US 4,465,934 AVeeco Instruments Inc. · 1984