H01J 37/07
Eliminating deleterious effects due to thermal effects or electric or magnetic fields
Official title: Eliminating deleterious effects due to thermal effects or electric or magnetic fields (H01J37/073 - H01J37/077 take precedence)
H01J37/07 (Eliminating deleterious effects due to thermal effects or electric or magnetic fields) appears on 42 US grants and 48 published applications in this corpus.
Search patents in H01J- Granted patents
- 42
- Published applications
- 48
- Assignees
- 29
- Inventors
- 128
- Latest grant
- 24 Mar 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1978 | 1 | 0 |
| 1979 | 0 | 0 |
| 1980 | 0 | 0 |
| 1981 | 0 | 0 |
| 1982 | 0 | 0 |
| 1983 | 0 | 0 |
| 1984 | 0 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 1 | 0 |
| 1991 | 1 | 0 |
| 1992 | 1 | 0 |
| 1993 | 1 | 0 |
| 1994 | 0 | 0 |
| 1995 | 0 | 0 |
| 1996 | 0 | 0 |
| 1997 | 0 | 0 |
| 1998 | 0 | 0 |
| 1999 | 0 | 0 |
| 2000 | 0 | 0 |
| 2001 | 0 | 0 |
| 2002 | 0 | 0 |
| 2003 | 1 | 1 |
| 2004 | 0 | 1 |
| 2005 | 2 | 2 |
| 2006 | 0 | 1 |
| 2007 | 1 | 2 |
| 2008 | 0 | 0 |
| 2009 | 0 | 1 |
| 2010 | 1 | 1 |
| 2011 | 0 | 3 |
| 2012 | 2 | 0 |
| 2013 | 1 | 0 |
| 2014 | 2 | 5 |
| 2015 | 5 | 2 |
| 2016 | 3 | 0 |
| 2017 | 0 | 4 |
| 2018 | 2 | 1 |
| 2019 | 1 | 1 |
| 2020 | 2 | 4 |
| 2021 | 3 | 3 |
| 2022 | 1 | 3 |
| 2023 | 2 | 3 |
| 2024 | 1 | 3 |
| 2025 | 6 | 4 |
| 2026 | 1 | 3 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Structure for particle acceleration and charged particle beam apparatus24 Mar 2026US 12,586,748 B2Hitachi High-Tech Corporation
- Charged particle gun and charged particle beam system11 Nov 2025US 12,469,664 B2Hitachi High-Tech Corporation
- Charged particle beam device11 Nov 2025US 12,469,665 B2Hitachi High-Tech Corporation
- Electron source with magnetic suppressor electrode21 Oct 2025US 12,451,319 B2KLA Corporation
- Charged particle source module29 Apr 2025US 12,288,663 B2ASML Netherlands B. V.
- Insulator, Charged Particle Gun, and Charged Particle Beam Device6 Aug 2026US 2026/0229440 A1Hitachi High-Tech Corporation
- Measurement Method and Charged Particle Beam Device23 Jul 2026US 2026/0213124 A1Hitachi High-Tech Corporation
- Electron beam adjustment method, electron beam writing apparatus, and non-transitory computer-readable storage medium storing a program29 Jan 2026US 2026/0031298 A1NuFlare Technology, Inc.
- Ultra-high sensitivity hybrid inspection with full wafer coverage capability9 Oct 2025US 2025/0316437 A1KLA Corporation
- Electron gun and electron beam writing apparatus28 Aug 2025US 2025/0273423 A1NuFlare Technology, Inc.
Most cited
By later US patents
- Magnetic lens13US 6,852,982 B1FEI Company · 2005
- Method and device for cooling electron beam gun6US 4,983,806 A1991
- Electron beam gun for use in an electron beam evaporation source6US 5,182,488 AThe BOC Group, Inc. · 1993
- Charged particle multi-beamlet lithography system with modulation device6US 8,492,731 B2Mapper Lithography IP B.V. · 2013
- Charged particle multi-beamlet lithography system, modulation device, and method of manufacturing thereof6US 8,987,677 B2Mapper Lithography IP B.V. · 2015