Measurement Method and Charged Particle Beam Device
AssigneeHitachi High-Tech Corporation
InventorKazufumi MATSUKURA
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Abstract
An object of the invention is to provide a measurement technique capable of reducing an influence of drift of a probe position without using position information of the probe. A measurement method according to the invention includes: measuring, by a charged particle beam device, a displacement of a probe generated under a temperature condition when a sample is observed using the charged particle beam device; and specifying, by using a result of the measurement, a movement amount by which the probe is moved to offset the displacement (see FIG. 2).
Claims11
-10. (canceled)
A measurement method for measuring an electrical characteristic of a sample, which is to be observed using a charged particle beam device, by using a probe by bringing the probe into contact with the sample, the measurement method comprising:
- a step of measuring, by the charged particle beam device, a displacement of the probe generated under a temperature condition when the measurement is performed;
- a step of specifying a movement amount by which the probe is moved to offset the displacement;
- and
- a step of measuring the electrical characteristic while offsetting the displacement by using the specified movement amount when the electrical characteristic is measured by bringing the probe into contact with the sample, wherein
- the step of specifying the movement amount is performed in advance by measuring the displacement of the probe by the charged particle beam device in advance before the step of measuring the electrical characteristic, and
- in the step of measuring the electrical characteristic, the electrical characteristic is measured while offsetting the displacement by using the movement amount specified in advance without using information on a current position of the probe.
A charged particle beam device that observes a sample by irradiating the sample with a charged particle beam, the charged particle beam device comprising:
- a probe configured to come into contact with the sample and measure an electrical characteristic of the sample;
- and
- a control device configured to move a stage on which the sample is mounted, wherein the control device performs
- a step of measuring, by the charged particle beam, a displacement of the probe generated under a temperature condition when the observation is performed,
- a step of specifying a movement amount by which the probe is moved to offset the displacement, and
- a step of measuring the electrical characteristic while offsetting the displacement by using the specified movement amount when the electrical characteristic is measured by bringing the probe into contact with the sample,
- the control device performs the step of specifying the movement amount in advance by measuring the displacement of the probe in advance before the step of measuring the electrical characteristic, and
- the control device measures the electrical characteristic while offsetting the displacement by using the movement amount specified in advance without using information on a current position of the probe in the step of measuring the electrical characteristic.
Dependencies are inferred from the claim text.