H01J 2237/3174
Etching microareas
H01J2237/3174 (Etching microareas) appears on 868 US grants and 967 published applications in this corpus.
Search patents in H01J- Granted patents
- 868
- Published applications
- 967
- Assignees
- 208
- Inventors
- 1,407
- Latest grant
- 29 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1985 | 1 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 1 | 0 |
| 1992 | 2 | 0 |
| 1993 | 1 | 0 |
| 1994 | 1 | 0 |
| 1995 | 4 | 0 |
| 1996 | 8 | 0 |
| 1997 | 6 | 0 |
| 1998 | 12 | 0 |
| 1999 | 7 | 0 |
| 2000 | 7 | 0 |
| 2001 | 8 | 5 |
| 2002 | 10 | 17 |
| 2003 | 18 | 19 |
| 2004 | 15 | 32 |
| 2005 | 25 | 32 |
| 2006 | 29 | 48 |
| 2007 | 20 | 59 |
| 2008 | 33 | 57 |
| 2009 | 48 | 34 |
| 2010 | 36 | 40 |
| 2011 | 35 | 36 |
| 2012 | 44 | 33 |
| 2013 | 37 | 49 |
| 2014 | 56 | 36 |
| 2015 | 28 | 47 |
| 2016 | 45 | 40 |
| 2017 | 46 | 37 |
| 2018 | 40 | 31 |
| 2019 | 33 | 37 |
| 2020 | 38 | 48 |
| 2021 | 42 | 35 |
| 2022 | 35 | 37 |
| 2023 | 26 | 43 |
| 2024 | 31 | 44 |
| 2025 | 19 | 37 |
| 2026 | 21 | 34 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- End point determination by means of contrast gas29 Sep 2026US 12,748,347 B2Carl Zeiss SMT GmbH
- Method of sample preparation and analysis25 Aug 2026US 12,719,012 B2FEI Company
- Methods and apparatus for processing a substrate14 Jul 2026US 12,685,050 B2APPLIED Materials.Inc.
- Method for particle beam-induced processing of a defect of a microlithographic photomask7 Jul 2026US 12,676,283 B2Carl Zeiss SMT GmbH
- Controlling etch angles by substrate rotation in angled etch tools30 Jun 2026US 12,669,635 B2APPLIED Materials.Inc.
- Adaptive illumination for a dual beam system10 Sep 2026US 2026/0269178 A1FEI Company
- Application Management For Charged Particle Microscope Devices10 Sep 2026US 2026/0269180 A1
- Workstation, preparation station and method for manipulating an electron microscopy grid assembly3 Sep 2026US 2026/0260839 A1Max-Planck-Gesellschaft Zur FöRderung Der Wissenschaften E. V.
- Charged Particle Beam Device and Method for Producing and Observing Sample Piece6 Aug 2026US 2026/0229446 A1Hitachi High-Tech Corporation
- Charged particle beam device and method for controlling charged particle beam device6 Aug 2026US 2026/0229452 A1Hitachi High-Tech Analysis Corporation
Most cited
By later US patents
- Method and apparatus for sample fabrication177US 6,538,254 B1Hitachi, Ltd. · 2003
- Manipulator for microscopy sample preparation and methods for making and use thereof170US 7,041,985 B1Western Digital (Fremont), LLC · 2006
- Precise metrology with adaptive milling154US 8,222,599 B1Western Digital (Fremont), LLC · 2012
- Metrology and 3D reconstruction of devices in a wafer153US 8,097,846 B1Western Digital (Fremont), LLC · 2012
- Electron beam processing98US 6,753,538 B2FEI Company · 2004