H01J 2237/3151
Etching
H01J2237/3151 (Etching) appears on 159 US grants and 205 published applications in this corpus.
Search patents in H01J- Granted patents
- 159
- Published applications
- 205
- Assignees
- 86
- Inventors
- 407
- Latest grant
- 30 Jun 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 1 | 0 |
| 1977 | 0 | 0 |
| 1978 | 0 | 0 |
| 1979 | 0 | 0 |
| 1980 | 0 | 0 |
| 1981 | 0 | 0 |
| 1982 | 0 | 0 |
| 1983 | 0 | 0 |
| 1984 | 0 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 1 | 0 |
| 1993 | 0 | 0 |
| 1994 | 0 | 0 |
| 1995 | 1 | 0 |
| 1996 | 1 | 0 |
| 1997 | 1 | 0 |
| 1998 | 1 | 0 |
| 1999 | 1 | 0 |
| 2000 | 1 | 0 |
| 2001 | 2 | 1 |
| 2002 | 1 | 1 |
| 2003 | 3 | 4 |
| 2004 | 4 | 3 |
| 2005 | 2 | 3 |
| 2006 | 4 | 6 |
| 2007 | 0 | 2 |
| 2008 | 4 | 9 |
| 2009 | 6 | 6 |
| 2010 | 2 | 7 |
| 2011 | 1 | 5 |
| 2012 | 7 | 6 |
| 2013 | 5 | 2 |
| 2014 | 1 | 4 |
| 2015 | 4 | 4 |
| 2016 | 3 | 10 |
| 2017 | 10 | 16 |
| 2018 | 6 | 6 |
| 2019 | 10 | 8 |
| 2020 | 13 | 11 |
| 2021 | 5 | 15 |
| 2022 | 9 | 20 |
| 2023 | 12 | 22 |
| 2024 | 18 | 11 |
| 2025 | 15 | 9 |
| 2026 | 4 | 14 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Controlling etch angles by substrate rotation in angled etch tools30 Jun 2026US 12,669,635 B2APPLIED Materials.Inc.
- Sample holder, loading device, and method for inserting a sample into a sample holder21 Apr 2026US 12,609,267 B2Leica Microsystems CMS GmbH
- Wafer total thickness variation using maskless implant10 Feb 2026US 12,550,686 B2APPLIED Materials.Inc.
- Grid structures of ion beam etching (IBE) systems3 Feb 2026US 12,542,254 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Ion beam processing apparatus, electrode assembly, and method of cleaning electrode assembly23 Dec 2025US 12,505,979 B2Canon Anelva Corporation
- Apparatus and techniques for substrate processing using independent ion source and radical source13 Aug 2026US 2026/0237601 A1APPLIED Materials.Inc.
- Semiconductor manufacturing apparatus including reflector2 Jul 2026US 2026/0188604 A1Samsung Electronics Co., Ltd.
- Battery state control during cross-section beam milling18 Jun 2026US 2026/0171345 A1FEI Company
- Charged particle beam device and method for controlling charged particle beam device18 Jun 2026US 2026/0171354 A1Hitachi High-Tech Science Corporation
- Substrate processing device18 Jun 2026US 2026/0173245 A1Samsung Electronics Co., Ltd.
Most cited
By later US patents
- Ion beam preparation device for electron microscopy85US 5,986,264 ABal-Tec A.G. · 1999
- Low-temperature, converging, reactive gas source and method of use68US 8,328,982 B1Surfx Technologies LLC · 2012
- Focused particle beam systems and methods using a tilt column64US 6,039,000 AMicrion Corporation · 2000
- Method and apparatus for improved processing with a gas-cluster ion beam56US 7,060,989 B2Epion Corporation · 2006
- Enhanced etching/smoothing of dielectric surfaces35US 6,331,227 B1Epion Corporation · 2001