H01J 2237/30433
System calibration
H01J2237/30433 (System calibration) appears on 417 US grants and 366 published applications in this corpus.
Search patents in H01J- Granted patents
- 417
- Published applications
- 366
- Assignees
- 123
- Inventors
- 751
- Latest grant
- 30 Jun 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1977 | 1 | 0 |
| 1978 | 0 | 0 |
| 1979 | 0 | 0 |
| 1980 | 0 | 0 |
| 1981 | 0 | 0 |
| 1982 | 1 | 0 |
| 1983 | 0 | 0 |
| 1984 | 0 | 0 |
| 1985 | 0 | 0 |
| 1986 | 2 | 0 |
| 1987 | 2 | 0 |
| 1988 | 1 | 0 |
| 1989 | 3 | 0 |
| 1990 | 1 | 0 |
| 1991 | 1 | 0 |
| 1992 | 8 | 0 |
| 1993 | 2 | 0 |
| 1994 | 5 | 0 |
| 1995 | 3 | 0 |
| 1996 | 5 | 0 |
| 1997 | 4 | 0 |
| 1998 | 9 | 0 |
| 1999 | 16 | 0 |
| 2000 | 3 | 0 |
| 2001 | 12 | 5 |
| 2002 | 11 | 10 |
| 2003 | 14 | 12 |
| 2004 | 15 | 23 |
| 2005 | 13 | 16 |
| 2006 | 16 | 18 |
| 2007 | 10 | 28 |
| 2008 | 17 | 25 |
| 2009 | 31 | 17 |
| 2010 | 11 | 10 |
| 2011 | 16 | 4 |
| 2012 | 13 | 12 |
| 2013 | 6 | 18 |
| 2014 | 15 | 8 |
| 2015 | 11 | 18 |
| 2016 | 18 | 20 |
| 2017 | 20 | 25 |
| 2018 | 18 | 18 |
| 2019 | 17 | 17 |
| 2020 | 23 | 13 |
| 2021 | 9 | 6 |
| 2022 | 4 | 13 |
| 2023 | 12 | 7 |
| 2024 | 8 | 14 |
| 2025 | 5 | 5 |
| 2026 | 5 | 4 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Adjustable permanent magnetic lens having shunting device30 Jun 2026US 12,671,054 B2IMS Nanofabrication GmbH
- Charged particle beam writing method and charged particle beam writing apparatus26 May 2026US 12,640,341 B2NuFlare Technology, Inc.
- Multi charged particle beam writing method and multi charged particle beam writing apparatus21 Apr 2026US 12,609,278 B2NuFlare Technology, Inc.
- Wafer positioning method and apparatus17 Feb 2026US 12,557,602 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Beam detector, multi charged particle beam irradiation apparatus, and beam detector adjustment method27 Jan 2026US 12,537,160 B2NuFlare Technology, Inc.
- Method of configuring a charged particle beam system and charged particle beam system13 Aug 2026US 2026/0237599 A1ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH
- Evaluation pattern formation method and position variation evaluation method23 Jul 2026US 2026/0213127 A1NuFlare Technology, Inc.
- Abnormality diagnosis method for blanking aperture array substrate and multi-beam writing method2 Jul 2026US 2026/0188609 A1NuFlare Technology, Inc.
- Method and system for calibrating a charged-particle spectrometer26 Mar 2026US 2026/0088248 A1Centre National De La Recherche Scientifique
- Scanning electron microscopy (sem) back-scattering electron (bse) focused target and method18 Dec 2025US 2025/0385070 A1ASML Netherlands B. V.
Most cited
By later US patents
- Electron beam inspection system and method257US 5,502,306 AKLA Instruments Corporation · 1996
- Apparatus and methods for electron beam detection111US 8,692,204 B2KLA-Tencor Corporation · 2014
- Ion sources, systems and methods93US 7,554,096 B2ALIS Corporation · 2009
- Electron beam exposure apparatus and method of controlling same80US 5,864,142 ACanon Kabushiki Kaisha · 1999
- Electron beam exposure system79US 6,897,458 B2Mapper Lithography IP B.V. · 2005