H01J 2237/3045
Deflection calibration
H01J2237/3045 (Deflection calibration) appears on 104 US grants and 95 published applications in this corpus.
Search patents in H01J- Granted patents
- 104
- Published applications
- 95
- Assignees
- 42
- Inventors
- 190
- Latest grant
- 26 May 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1986 | 1 | 0 |
| 1987 | 0 | 0 |
| 1988 | 1 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 3 | 0 |
| 1993 | 0 | 0 |
| 1994 | 3 | 0 |
| 1995 | 0 | 0 |
| 1996 | 1 | 0 |
| 1997 | 1 | 0 |
| 1998 | 0 | 0 |
| 1999 | 3 | 0 |
| 2000 | 0 | 0 |
| 2001 | 3 | 1 |
| 2002 | 2 | 4 |
| 2003 | 3 | 1 |
| 2004 | 2 | 5 |
| 2005 | 2 | 5 |
| 2006 | 4 | 6 |
| 2007 | 3 | 1 |
| 2008 | 5 | 15 |
| 2009 | 9 | 8 |
| 2010 | 6 | 3 |
| 2011 | 5 | 2 |
| 2012 | 8 | 0 |
| 2013 | 1 | 3 |
| 2014 | 3 | 1 |
| 2015 | 1 | 4 |
| 2016 | 6 | 11 |
| 2017 | 7 | 2 |
| 2018 | 1 | 4 |
| 2019 | 4 | 7 |
| 2020 | 7 | 2 |
| 2021 | 2 | 1 |
| 2022 | 2 | 4 |
| 2023 | 1 | 2 |
| 2024 | 0 | 3 |
| 2025 | 2 | 0 |
| 2026 | 2 | 0 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Charged particle beam writing method and charged particle beam writing apparatus26 May 2026US 12,640,341 B2NuFlare Technology, Inc.
- Multi charged particle beam writing method and multi charged particle beam writing apparatus21 Apr 2026US 12,609,278 B2NuFlare Technology, Inc.
- Semiconductor analysis system7 Oct 2025US 12,436,114 B2Hitachi High-Tech Corporation
- Charged particle beam device and inspection device25 Feb 2025US 12,237,145 B2Hitachi High-Tech Corporation
- Charged particle beam device24 Oct 2023US 11,798,780 B2Hitachi High-Tech Corporation
- Device and Method for Calibrating a Charged-Particle Beam12 Sep 2024US 2024/0304407 A1IMS Nanofabrication GmbH
- Charged particle beam device and inspection device5 Sep 2024US 2024/0297012 A1Hitachi High-Tech Corporation
- Apparatus for analysing and/or processing a sample with a particle beam and method27 Jun 2024US 2024/0210335 A1
- Semiconductor Analysis System23 Feb 2023US 2023/0055155 A1Hitachi High-Tech Corporation
- Charged particle beam writing method and charged particle beam writing apparatus2 Feb 2023US 2023/0029715 A1NuFlare Technology, Inc.
Most cited
By later US patents
- Electron beam exposure apparatus and method of controlling same80US 5,864,142 ACanon Kabushiki Kaisha · 1999
- Electron beam exposure system79US 6,897,458 B2Mapper Lithography IP B.V. · 2005
- Charged particle beam deflection method with separate stage tracking and stage positional error signals49US 8,384,048 B2Multibeam Corporation · 2013
- Charged particle beam exposure apparatus48US 7,692,166 B2Canon Kabushiki Kaisha · 2010
- Electron beam exposure system43US 7,091,504 B2Mapper Lithography IP B.V. · 2006