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US 2024/0210335 A1Published application
Apparatus for analysing and/or processing a sample with a particle beam and method
OwnerDaniel Rhinowinventor
Life of this patent
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Abstract
What is proposed is an apparatus for analysing and/or processing a sample with a particle beam, comprising: a providing unit for providing the particle beam; and a test structure attached to the providing unit; wherein the apparatus is configured for implementing an etching process and/or a deposition process on the test structure using the particle beam.
Claims20
An apparatus for analysing and/or processing a sample with a particle beam, comprising:
- a providing unit for providing the particle beam, the providing unit having an opening for the particle beam to pass through to the sample;
- and
- a test structure attached to the providing unit, the test structure being arranged inside or adjacent to the opening of the providing unit;
- wherein the apparatus is configured for implementing an etching process and/or a deposition process on the test structure using the particle beam.
1 more element
A method for providing a test structure in an apparatus for analysing and/or processing a sample with a particle beam, wherein the apparatus comprises:
- a providing unit being configured for providing the particle beam, the providing unit having an opening for the particle beam to pass through to the sample;
- and
- the test structure attached to the providing unit, the test structure being arranged inside or adjacent to the opening of the providing unit;
- wherein the method comprises:
- implementing an etching process and/or a deposition process on the test structure using the particle beam.
2 more elements
Dependencies are inferred from the claim text.