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US 5,864,142 AGranted
Electron beam exposure apparatus and method of controlling same
AssigneeCanon Kabushiki Kaisha
InventorsMasato Muraki, Susumu Goto
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AssigneeCanon Kabushiki Kaisha
InventorsMasato Muraki, Susumu Goto
Estimating the term…
A beam coordinate system decided by a plurality of beam reference positions and a deflection coordinate system decided by a deflector in a multi-electron beam exposure apparatus are made to coincide in a highly precise fashion and exposure is performed upon rapidly correcting a change in the offset between the two coordinate systems with the passage of time. The apparatus has an adjusting unit for adjusting an XY stage or a deflector based upon a first parameter representing the relationship between the beam coordinate system, which is decided by the plurality of beam reference positions, and the design coordinate system, and a second parameter representing the relationship between the deflection coordinate system, which is decided by the deflector, and the design coordinate system.
An electron beam exposure apparatus having irradiating means for causing a plurality of electron beams to be arrayed on and to irradiate a substrate, deflecting means for deflecting the plurality of electron beams, which are caused to irradiate the substrate by said irradiating means, by approximately identical amounts of deviation, and driving means for driving a stage on which the substrate is placed, said apparatus comprising:
An electron beam exposure apparatus having irradiating means that includes a plurality of electron beam sources, wherein a plurality of electron beams emitted by respective ones of said plurality of electron beam sources are arrayed on and irradiate a substrate, deflecting means for deflecting the plurality of electron beams, which are caused to irradiate the substrate by said irradiating means, by approximately identical amounts of deviation, and driving means for driving a stage on which the substrate is placed, said apparatus comprising:
A method of controlling an electron beam exposure apparatus having irradiating means for causing a plurality of electron beams to be arrayed on and to irradiate a substrate, deflecting means for deflecting the plurality of electron beams, which are caused to irradiate the substrate by said irradiating means, by approximately identical amounts of deviation, driving means for driving a stage on which the substrate is placed, and detecting means for detecting irradiation positions of the electron beams which irradiate the stage, said method comprising:
A method of controlling an electron beam exposure apparatus having irradiating means that includes a plurality of electron beam sources, wherein a plurality of electron beams emitted by respective ones of said plurality of electron beam sources are arrayed on and irradiate a substrate, deflecting means for deflecting the plurality of electron beams, which are caused to irradiate the substrate by said irradiating means, by approximately identical amounts of deviation, driving means for driving a stage on which the substrate is placed, and detecting means for detecting irradiation positions of the electron beams which irradiate the stage, said method comprising:
A computer readable program for controlling an electron beam exposure apparatus having irradiating means for causing a plurality of electron beams to be arrayed on and to irradiate a substrate, deflecting means for deflecting the plurality of electron beams, which are caused to irradiate the substrate by said irradiating means, by approximately identical amounts of deviation, driving means for driving a stage on which the substrate is placed, and detecting means for detecting irradiation positions of the electron beams which irradiate the stage, said program comprising:
A computer readable program for controlling an electron beam exposure apparatus having irradiating means that includes a plurality of electron beam sources, wherein a plurality of electron beams emitted by respective ones of said plurality of electron beam sources are arrayed on and irradiate a substrate, deflecting means for deflecting the plurality of electron beams, which are caused to irradiate the substrate by said irradiating means, by approximately identical amounts of deviation, driving means for driving a stage on which the substrate is placed, and detecting means for detecting irradiation positions of the electron beams which irradiate the stage, said program comprising:
Dependencies are inferred from the claim text.