Semiconductor Analysis System
AssigneeHitachi High-Tech Corporation
InventorsTsunenori NOMAGUCHI, Yudai KUBO, Hiroyuki CHIBA
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Abstract
A semiconductor analysis system includes a machining device that machines a semiconductor wafer to prepare a thin film sample for observation, a transmission electron microscope device that acquires a transmission electron microscope image of the thin film sample, and a host control device that controls the machining device and the transmission electron microscope device. The host control device evaluates the thin film sample based on the transmission electron microscope image, updates acquisition conditions of the transmission electron microscope image based on an evaluation result of the thin film sample, and outputs the updated acquisition conditions to the transmission electron microscope device
Claims8
-7. (canceled)
A semiconductor analysis system comprising:
- a machining device that machines a semiconductor wafer to prepare a thin film sample for observation;
- a transmission electron microscope device that acquires a transmission electron microscope image of the thin film sample;
- and
- a control device that controls the machining device and the transmission electron microscope device,
- wherein the control device evaluates the thin film sample based on the transmission electron microscope image, updates acquisition conditions of the transmission electron microscope image based on an evaluation result of the thin film sample, outputs the updated acquisition conditions to the transmission electron microscope device, and
- uses the updated acquisition conditions to acquire a transmission electron microscope image of a thin film sample different from the thin film sample.
Dependencies are inferred from the claim text.