Charged particle beam device and inspection device

An inspection device for inspecting a pattern formed on a sample at a plurality of inspection portions, the inspection device comprising:

• a charged particle optical system including a charged particle beam source configured to emit a charged particle beam, a plurality of lenses configured to focus the charged particle beam on the sample, and a deflector configured to scan the sample with the charged particle beam;
• a detector configured to detect secondary charged particles, which are emitted due to an interaction between the charged particle beam and the sample, and output a detection signal;
• a calculation unit configured to calibrate first image data generated based on the detection signal output from the detector when the sample is two-dimensionally scanned with the charged particle beam, so as to generate second image data;
• and
• a storage device configured to store a plurality of power spectral densities P(f) of a window function corresponding to a signal processing delay in the detector, wherein
• the deflector two-dimensionally scans the sample with the charged particle beam by repeating scanning with the charged particle beam in a first direction while shifting a position in a second direction orthogonal to the first direction, and
• the calculation unit generates the second image data using n first signal profiles each of which corresponds to a signal strength distribution in the first direction and which are extracted from the first image data and a first power spectral density P(f) (f:
• spatial frequency) of the window function called out from the storage device, and determines whether the pattern imaged in the first image data is defective based on the second image data.