H01J 2237/30438
Registration
H01J2237/30438 (Registration) appears on 179 US grants and 153 published applications in this corpus.
Search patents in H01J- Granted patents
- 179
- Published applications
- 153
- Assignees
- 68
- Inventors
- 362
- Latest grant
- 17 Feb 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1977 | 1 | 0 |
| 1978 | 0 | 0 |
| 1979 | 0 | 0 |
| 1980 | 0 | 0 |
| 1981 | 0 | 0 |
| 1982 | 1 | 0 |
| 1983 | 0 | 0 |
| 1984 | 0 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 2 | 0 |
| 1988 | 0 | 0 |
| 1989 | 2 | 0 |
| 1990 | 1 | 0 |
| 1991 | 1 | 0 |
| 1992 | 1 | 0 |
| 1993 | 1 | 0 |
| 1994 | 2 | 0 |
| 1995 | 1 | 0 |
| 1996 | 4 | 0 |
| 1997 | 3 | 0 |
| 1998 | 4 | 0 |
| 1999 | 6 | 0 |
| 2000 | 3 | 0 |
| 2001 | 6 | 2 |
| 2002 | 4 | 5 |
| 2003 | 8 | 5 |
| 2004 | 5 | 8 |
| 2005 | 3 | 4 |
| 2006 | 7 | 5 |
| 2007 | 4 | 22 |
| 2008 | 8 | 6 |
| 2009 | 16 | 5 |
| 2010 | 3 | 4 |
| 2011 | 4 | 0 |
| 2012 | 4 | 10 |
| 2013 | 3 | 8 |
| 2014 | 7 | 4 |
| 2015 | 6 | 10 |
| 2016 | 10 | 5 |
| 2017 | 10 | 15 |
| 2018 | 12 | 4 |
| 2019 | 4 | 5 |
| 2020 | 5 | 1 |
| 2021 | 2 | 2 |
| 2022 | 1 | 6 |
| 2023 | 6 | 2 |
| 2024 | 3 | 9 |
| 2025 | 3 | 4 |
| 2026 | 2 | 2 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Wafer positioning method and apparatus17 Feb 2026US 12,557,602 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Beam detector, multi charged particle beam irradiation apparatus, and beam detector adjustment method27 Jan 2026US 12,537,160 B2NuFlare Technology, Inc.
- Wafer positioning method and apparatus29 Jul 2025US 12,374,519 B2Taiwan Semiconductor Manufacturing Company.Ltd
- 3D metrology from 3D datacube created from stack of registered images obtained during delayering of the sample8 Apr 2025US 12,272,518 B2Applied Materials Israel Ltd.
- Embedded high-z marker material and process for alignment of multilevel ebeam lithography18 Mar 2025US 12,255,047 B1HRL Laboratories, LLC
- Evaluation pattern formation method and position variation evaluation method23 Jul 2026US 2026/0213127 A1NuFlare Technology, Inc.
- Method and system for calibrating a charged-particle spectrometer26 Mar 2026US 2026/0088248 A1Centre National De La Recherche Scientifique
- Scanning electron microscopy (sem) back-scattering electron (bse) focused target and method18 Dec 2025US 2025/0385070 A1ASML Netherlands B. V.
- Wafer positioning method and apparatus25 Sep 2025US 2025/0299912 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Position measurement apparatus, charged particle beam writing apparatus, and mark position measurement method25 Sep 2025US 2025/0299918 A1NuFlare Technology, Inc.
Most cited
By later US patents
- Electron beam inspection system and method257US 5,502,306 AKLA Instruments Corporation · 1996
- Apparatus and methods for electron beam detection111US 8,692,204 B2KLA-Tencor Corporation · 2014
- Ion sources, systems and methods93US 7,554,096 B2ALIS Corporation · 2009
- Electron beam exposure apparatus and method of controlling same80US 5,864,142 ACanon Kabushiki Kaisha · 1999
- Ion beam lithography71US 4,985,634 AOesterreichische Investitionskredit Aktiengesellschaft and Ionen Mikrofabrications · 1991