Beam detector, multi charged particle beam irradiation apparatus, and beam detector adjustment method
AssigneeNuFlare Technology, Inc.
InventorsYasutaka Sato, Kiminobu Akeno
Life of this patent
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Abstract
According to one embodiment, a beam detector includes a first aperture substrate including a first passage hole smaller than a pitch between beams of a multi charged particle beam, a second aperture substrate including a second passage hole allowing one detection target beam which has passed through the first passage hole, and a sensor detecting a beam current of the detection target beam which has passed through the second passage hole. The second aperture substrate has light permeability, and includes a conductive material.
Claims15
A beam detector comprising:
- a first aperture substrate including a first passage hole smaller than a pitch between beams of a multi charged particle beam;
- a second aperture substrate including a second passage hole allowing one detection target beam which has passed through the first passage hole;
- and
- a sensor detecting a beam current of the detection target beam which has passed through the second passage hole,
- wherein the second aperture substrate has light permeability, and includes a conductive material.
A multi charged particle beam irradiation apparatus comprising:
- a stage on which a writing target substrate is placed;
- an emitter emitting a charged particle beam;
- a shaping aperture array substrate receiving irradiation of the charged particle beam, and forming a multi-beam by allowing part of the charged particle beam;
- an optical system radiating the multi-beam onto the writing target substrate;
- and
- a beam detector disposed on the stage individually detecting beams in the multi-beam,
- wherein the beam detector includes:
- a first aperture substrate including a first passage hole smaller than a pitch between beams of the multi-beam;
- a second aperture substrate including a second passage hole allowing one detection target beam which has passed through the first passage hole;
- and
- a sensor detecting a beam current of the detection target beam which has passed through the second passage hole,
- wherein the second aperture substrate has light permeability, and includes a conductive material.
A beam detector adjustment method to align a first passage hole formed in a first aperture substrate with a second passage hole formed in a second aperture substrate, the first passage hole being smaller than a pitch between beams of a multi charged particle beam, the second passage hole allowing one detection target beam of the multi charged particle beam,
- the method comprising:
- radiating light emitted from a light source to the first aperture substrate through the second aperture substrate, focusing an objective lens to the first aperture substrate, observing image formation of reflected light incident through the objective lens using an image sensor, and setting a position of the first passage hole as a reference mark;
- and
- focusing the objective lens to the second aperture substrate, observing image formation of reflected light incident through the objective lens using the image sensor, and moving the second aperture substrate so that a position of the second passage hole matches the reference mark.
Dependencies are inferred from the claim text.