H01J 2237/30444
Calibration grids
H01J2237/30444 (Calibration grids) appears on 16 US grants and 11 published applications in this corpus.
Search patents in H01J- Granted patents
- 16
- Published applications
- 11
- Assignees
- 13
- Inventors
- 42
- Latest grant
- 17 Jul 2018
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1994 | 1 | 0 |
| 1995 | 0 | 0 |
| 1996 | 1 | 0 |
| 1997 | 0 | 0 |
| 1998 | 1 | 0 |
| 1999 | 0 | 0 |
| 2000 | 0 | 0 |
| 2001 | 3 | 0 |
| 2002 | 0 | 0 |
| 2003 | 1 | 2 |
| 2004 | 1 | 0 |
| 2005 | 0 | 0 |
| 2006 | 0 | 0 |
| 2007 | 0 | 0 |
| 2008 | 0 | 2 |
| 2009 | 0 | 1 |
| 2010 | 1 | 0 |
| 2011 | 0 | 0 |
| 2012 | 1 | 0 |
| 2013 | 0 | 0 |
| 2014 | 0 | 1 |
| 2015 | 1 | 1 |
| 2016 | 1 | 0 |
| 2017 | 1 | 0 |
| 2018 | 3 | 1 |
| 2019 | 0 | 0 |
| 2020 | 0 | 0 |
| 2021 | 0 | 0 |
| 2022 | 0 | 1 |
| 2023 | 0 | 0 |
| 2024 | 0 | 2 |
By publication year. Applications have been published since 2001.
Recent patents
- Alignment and registration targets for charged particle beam substrate patterning and inspection17 Jul 2018US 10,026,589 B1
- Alignment and registration targets for charged particle beam substrate patterning and inspection10 Jul 2018US 10,020,166 B1
- Structure and method to measure focus-dependent pattern shift in integrated circuit imaging20 Feb 2018US 9,899,183 B1Globalfoundries Inc.
- Alignment and registration targets for multiple-column charged particle beam lithography and inspection14 Mar 2017US 9,595,419 B1Multibeam Corporation
- Alignment and registration targets for multiple-column charged particle beam lithography and inspection25 Oct 2016US 9,478,395 B1Multibeam Corporation
- Device and Method for Calibrating a Charged-Particle Beam12 Sep 2024US 2024/0304407 A1IMS Nanofabrication GmbH
- Apparatus for analysing and/or processing a sample with a particle beam and method27 Jun 2024US 2024/0210335 A1
- X-ray reference object, x-ray detector, additive manufacturing apparatus and method for calibrating the same12 May 2022US 2022/0143709 A1Arcam AB
- Structure and method to measure focus-dependent pattern shift in integrated circuit imaging1 Feb 2018US 2018/0033590 A1Globalfoundries Inc.
- Target device, lithography apparatus, and article manufacturing method5 Nov 2015US 2015/0318139 A1Canon Kabushiki Kaisha
Most cited
By later US patents
- Variable transmission reticle for charged particle beam lithography tool26US 6,262,427 B1Nikon Corporation · 2001
- Alignment and registration targets for multiple-column charged particle beam lithography and inspection21US 9,478,395 B1Multibeam Corporation · 2016
- Fabrication and use of sub-micron dimensional standard17US 5,585,211 A1996
- Repositionable substrate for microscopes16US 5,365,072 AThe United States of America as represented by the Secretary of the Navy · 1994
- Alignment and registration targets for multiple-column charged particle beam lithography and inspection16US 9,595,419 B1Multibeam Corporation · 2017