Target device, lithography apparatus, and article manufacturing method
AssigneeCanon Kabushiki Kaisha
InventorMitsuaki Amemiya
Life of this patent
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Abstract
Provided is a target device for scattering a charged particle incident thereon, the device comprising: a base; a reference mark provided on the base and having a range of the charged particle therein smaller than a range of the charged particle in the base; and a shield provided on the base apart from the reference mark and having a range of the charged particle therein smaller than the range of the charged particle in the base.
Claims17
A target device for scattering a charged particle incident thereon, the device comprising:
- a base;
- a reference mark provided on the base and having a range of the charged particle therein smaller than a range of the charged particle in the base;
- and
- a shield provided on the base apart from the reference mark and having a range of the charged particle therein smaller than the range of the charged particle in the base.
A lithography apparatus for performing patterning on a substrate with a charged particle beam, the apparatus comprising:
- a target device, for scattering a charged particle incident thereon, the device comprising:
- a base;
- a reference mark provided on the base and having a range of the charged particle therein smaller than a range of the charged particle in the base;
- and
- a shield provided on the base apart from the reference mark and having a range of the charged particle therein smaller than the range of the charged particle in the base;
- and
- detector configured to detect a charged particle scattered by the target device.
A method of manufacturing an article, the method comprising steps of:
- performing patterning on a substrate using a lithography apparatus;
- and
- processing the substrate, on which the patterning has been performed, to manufacture the article,
- wherein the lithography apparatus performs patterning on the substrate with a charged particle beam, and includes:
- a target device for scattering a charged particle incident thereon, the device including:
- a base;
- a reference mark provided on the base and having a range of the charged particle therein smaller than a range of the charged particle in the base;
- and
- a shield provided on the base apart from the reference mark and having a range of the charged particle therein smaller than the range of the charged particle in the base.
Dependencies are inferred from the claim text.