H01J 2237/201
For mounting multiple objects
Official title: for mounting multiple objects
H01J2237/201 (For mounting multiple objects) appears on 137 US grants and 172 published applications in this corpus.
Search patents in H01J- Granted patents
- 137
- Published applications
- 172
- Assignees
- 81
- Inventors
- 312
- Latest grant
- 28 Jul 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1988 | 1 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 1 | 0 |
| 1992 | 0 | 0 |
| 1993 | 0 | 0 |
| 1994 | 0 | 0 |
| 1995 | 0 | 0 |
| 1996 | 0 | 0 |
| 1997 | 0 | 0 |
| 1998 | 0 | 0 |
| 1999 | 0 | 0 |
| 2000 | 0 | 0 |
| 2001 | 0 | 0 |
| 2002 | 0 | 0 |
| 2003 | 0 | 1 |
| 2004 | 2 | 0 |
| 2005 | 1 | 2 |
| 2006 | 2 | 4 |
| 2007 | 2 | 9 |
| 2008 | 5 | 9 |
| 2009 | 5 | 7 |
| 2010 | 7 | 13 |
| 2011 | 9 | 4 |
| 2012 | 4 | 10 |
| 2013 | 9 | 7 |
| 2014 | 8 | 9 |
| 2015 | 9 | 9 |
| 2016 | 7 | 6 |
| 2017 | 5 | 4 |
| 2018 | 5 | 3 |
| 2019 | 4 | 3 |
| 2020 | 7 | 9 |
| 2021 | 3 | 5 |
| 2022 | 5 | 7 |
| 2023 | 6 | 33 |
| 2024 | 7 | 11 |
| 2025 | 15 | 5 |
| 2026 | 8 | 2 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Ion beam deposition apparatus and ion beam deposition method using the same28 Jul 2026US 12,695,049 B2Samsung Electronics Co., Ltd.
- Apparatus and techniques for substrate processing using independent ion source and radical source28 Jul 2026US 12,695,056 B2APPLIED Materials.Inc.
- Batch type substrate processing apparatus14 Jul 2026US 12,683,129 B2Eugene Technology Co., Ltd.
- Plasma processing apparatus and method of manufacturing semiconductor device14 Jul 2026US 12,683,133 B2Samsung Electronics Co., Ltd.
- Plasma processing apparatus and plasma processing method5 May 2026US 12,620,561 B2Tokyo Electron Limited
- Apparatus and techniques for substrate processing using independent ion source and radical source13 Aug 2026US 2026/0237601 A1APPLIED Materials.Inc.
- Ion implanter9 Jul 2026US 2026/0198260 A1Nissin Ion Equipment Co., Ltd.
- Broad ion beam (bib) systems for more efficient processing of multiple samples16 Oct 2025US 2025/0321164 A1FEI Company
- Airless transfer and electrical testing of solid state batteries in scanning electron microscopes2 Oct 2025US 2025/0308837 A1FEI Company
- Ion implanter and ion implantation method4 Sep 2025US 2025/0279257 A1Sumitomo Heavy Industries Ion Technology Co., Ltd.
Most cited
By later US patents
- Substrate processing apparatus346US 8,741,065 B2Tokyo Electron Limited · 2014
- Method and apparatus for specimen fabrication39US 7,071,475 B2Hitachi, Ltd. · 2006
- Method and apparatus for specimen fabrication37US 6,828,566 B22004
- Methods and apparatuses for the automated production, collection, handling, and imaging of large numbers of serial tissue sections33US 7,677,289 B2President and Fellows of Harvard College · 2010
- Method and apparatus for in-situ probe tip replacement inside a charged particle beam microscope23US 7,381,971 B2Omniprobe, Inc. · 2008